Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | PDE4A | P27815 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | BLM | P54132 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3462969 | 0.89 | APP (0.34) | EPHX1TSHR | |
| SCHEMBL3463378 | 0.86 | EPHX1 (0.31) | EPHX1 | |
| SCHEMBL30343632 | 0.85 | — | — | |
| SCHEMBL3463380 | 0.80 | EPHX2 (0.35) | — | |
| SCHEMBL25245782 | 0.79 | EPHX1 (0.34) | EPHX1TSHR | |
| SCHEMBL3462952 | 0.75 | EPHX1 (0.44) | EPHX1PTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL1352530 | 0.72 | — | — | |
| SCHEMBL617694 | 0.72 | — | — | |
| SCHEMBL15346493 | 0.71 | PTGS1 (0.39) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL3463549 | 0.69 | FFAR3 (0.37) | EPHX1TSHRPDE4ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100256308-A1 | PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2010-10-07 | — | — | US | claimed |
| US-20100256308-A1 | PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |