SCHEMBL346430

SCHEMBL346430

O=C(O)c1cc2ccc3c(C(=O)O)c(C(=O)O)ccc3c2cc1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
HSD17B10 Q99714 3/20 0.41
CYP2C19 P33261 2/20 0.41
CYP1A2 P05177 2/20 0.41
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
GLA P06280 1/20 0.41
HPGD P15428 1/20 0.41
GRIN2D O15399 2/20 0.40
GRIN2A Q12879 2/20 0.40
GRIN2C Q14957 2/20 0.40
GRIN2B Q13224 1/20 0.40
PTPN1 P18031 1/20 0.40
RXFP1 Q9HBX9 1/20 0.39
LCK P06239 1/20 0.39
WDR5 P61964 1/20 0.39
GPR35 Q9HC97 2/20 0.38
CDC25B P30305 2/20 0.38
LDHA P00338 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31401800 0.90 ALDH1A1 (0.45) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL338480 0.90 ALDH1A1 (0.45) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL9175554 0.88 GRIN2D (0.47) MEN1KMT2AHSD17B10KDM4EALDH1A1
SCHEMBL5886119 0.84 GRIN2D (0.50) MEN1KMT2AHSD17B10CYP1A2KDM4E
SCHEMBL202564 0.84 CYP1A2 (0.50) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL8681045 0.83 HSD17B10 (0.47) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL258673 0.82 ALDH1A1 (0.48) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL48997 0.82 CYP1A2 (0.52) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL29420737 0.82 CYP1A2 (0.52) MEN1KMT2AHSD17B10CYP2C19CYP1A2
SCHEMBL20873397 0.81 CYP1A2 (0.41) MEN1KMT2AHSD17B10CYP2C19CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021118671-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY (US) 2021-06-17 WO claimed
US-20210179800-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY 2021-06-17 US claimed
CN-117794048-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2024-03-29 CN disclosed
CN-113402882-B Composition for forming release layer 日产化学工业株式会社 2024-02-06 CN disclosed
CN-115971017-B Method for producing polyimide film, method for producing metal-clad laminate, and method for producing circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-111746080-B Metal-clad laminate and circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-117279198-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2023-12-22 CN disclosed
CN-117210002-A Resin film, coverlay film, circuit board, resin-coated copper foil, metal-clad laminate, and multilayer circuit board 日铁化学材料株式会社 2023-12-12 CN disclosed
CN-117067718-A Metal-clad laminate and circuit board 日铁化学材料株式会社 2023-11-17 CN disclosed
CN-117050306-A Method for producing polyimide 日铁化学材料株式会社 2023-11-14 CN disclosed
CN-117048152-A Method for manufacturing metal-clad laminate 日铁化学材料株式会社 2023-11-14 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
US-5350663-A Construction of electrical circuits and protective or insulating layers for electronic components BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) 1994-09-27 US disclosed
EP-0573866-A1 Method for forming patterned layers of heat-resistant polycondensates BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-15 EP disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed
US-5238784-A PHOTOSENSITIVE RESIN COMPOSITION WITH POLYAMIC ACID POLYMER SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-08-24 US disclosed
US-5206337-A Heat resistance, moldability, workability SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-04-27 US disclosed
EP-0456512-A2 Polyimidesiloxane oligomer SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-11-13 EP disclosed
EP-0430220-A2 Photosensitive resin composition and semiconductor apparatus using it SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed
EP-0430221-A2 Photosensitive resin composition SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed