⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13020895 | 1.00 | — | — | |
| SCHEMBL13020896 | 1.00 | — | — | |
| SCHEMBL10580480 | 0.79 | — | — | |
| SCHEMBL14996728 | 0.79 | — | — | |
| SCHEMBL15463167 | 0.79 | — | — | |
| SCHEMBL9011742 | 0.78 | MAPK1 (0.40) | — | |
| SCHEMBL7052848 | 0.75 | — | — | |
| SCHEMBL7880866 | 0.75 | — | — | |
| SCHEMBL2153306 | 0.75 | — | — | |
| SCHEMBL5428568 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119859931-A | Method for decoloring polyester cloth | 财团法人纺织产业综合研究所 | 2025-04-22 | — | — | CN | claimed |
| EP-2414471-B1 | PLASTIC ADHESIVE COMPOSITION | HENKEL AG & CO KGAA (DE) | 2013-03-20 | — | — | EP | claimed |
| EP-2414471-A1 | PLASTIC ADHESIVE COMPOSITION | Henkel AG & Co. KGaA (DE) | 2012-02-08 | — | — | EP | claimed |
| WO-2010112551-A1 | PLASTIC ADHESIVE COMPOSITION | HENKEL AG & CO. KGAA (DE) | 2010-10-07 | — | — | WO | claimed |
| US-7704602-B2 | Iodine/iodide-containing hot melt coatable adhesive, methods and uses therefor | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2010-04-27 | — | — | US | claimed |
| JP-8176053-A | — | — | None | — | — | JP | disclosed |
| US-20260079400-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-19 | — | — | US | disclosed |
| US-12545790-B2 | Antifoggant composition and anti-fog article having antifogging film formed from said composition | NOF CORPORATION (JP) | 2026-02-10 | — | — | US | disclosed |
| EP-4675351-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-20250370337-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| CN-119859931-A | Method for decoloring polyester cloth | 财团法人纺织产业综合研究所 | 2025-04-22 | — | — | CN | disclosed |
| US-20250123566-A1 | ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-04-17 | — | — | US | disclosed |
| EP-1026002-A1 | Additive for inkjet printing | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-08-09 | — | — | EP | disclosed |
| US-6071674-A | ANODIZED METAL PLATE COATED WITH PHOTOSENSITIVE LAYER CONTAINING PHOTOACID GENERATOR, ACID DECOMPOSABLE COMPOUND AND CYANINE DYE INFRARED ABSORBER | KONICA CORPORATION (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6051361-A | PHOTOSENSITIVE MIXTURE COMPRISING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF ACTINIC LIGHT, A COMPOUND CAN BE CROSSLINKING BY AN ACID, AN INFRARED ABSORBER AND AN ADDITIONAL POLYMER | KONICA CORPORATION (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0903225-A2 | Light sensitive composition and image forming material | KONICA CORPORATION (JP) | 1999-03-24 | — | — | EP | disclosed |
| EP-0884647-A1 | Image forming material and image forming method | KONICA CORPORATION (JP) | 1998-12-16 | — | — | EP | disclosed |
| JP-H08176053-A | PRODUCTION OF 3-SUBSTITUTED-3-METHYLBUTANAL | KURARAY CO LTD | 1996-07-09 | — | — | JP | disclosed |
| EP-0410609-A2 | Germicidal composition | SOMAR CORPORATION (JP) | 1991-01-30 | — | — | EP | disclosed |
| EP-0275899-A2 | Process for preparing particles having monodisperse particle size | Nippon Paint Co., Ltd. (JP) | 1988-07-27 | — | — | EP | disclosed |