Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | CASP1 | P29466 | 1/20 | 0.33 |
| ▸ | CASP7 | P55210 | 1/20 | 0.33 |
| ▸ | HBB | P68871 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | NQO2 | P16083 | 1/20 | 0.31 |
| ▸ | CYP2A6 | P11509 | 5/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL871456 | 0.98 | ALDH1A1 (0.37) | ALDH1A1CYP3A4HSD17B10TDP1ALOX15 | |
| SCHEMBL6860163 | 0.83 | — | — | |
| SCHEMBL17044612 | 0.81 | — | — | |
| SCHEMBL17044587 | 0.81 | — | — | |
| SCHEMBL17044613 | 0.81 | — | — | |
| SCHEMBL9324824 | 0.78 | CYP2A6 (0.35) | CYP2A6ALOX12 | |
| SCHEMBL132970 | 0.78 | CYP2A6 (0.35) | CYP2A6ALOX12 | |
| SCHEMBL17063430 | 0.78 | MEN1 (0.33) | CYP3A4HSD17B10MAPT | |
| SCHEMBL17044629 | 0.77 | — | — | |
| SCHEMBL17044617 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2098 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024101071-A1 | COMPOSITION, LIGHT EMITTING ELEMENT CONTAINING SAME, AND COMPOUND | 住友化学株式会社 | 2024-05-16 | — | — | WO | claimed |
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | claimed |
| US-20230357488-A1 | CURABLE RESIN COMPOSITION | CANON KK (JP) | 2023-11-09 | — | — | US | claimed |
| CN-111587403-B | Composition for hard mask | 东友精细化工有限公司 | 2023-09-19 | — | — | CN | claimed |
| WO-2023110330-A1 | COMPOUNDS FOR USE IN SEMICONDUCTIONG MATERIALS SUITABLE FOR ELECTRONIC DEVICES | NOVALED GMBH (DE) | 2023-06-22 | — | — | WO | claimed |
| EP-4198026-A1 | COMPOUNDS FOR USE IN SEMICONDUCTIONG MATERIALS SUITABLE FOR ELECTRONIC DEVICES | Novaled GmbH (DE) | 2023-06-21 | — | — | EP | claimed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | claimed |
| CN-116157382-A | Material for metal patterning, amine compound, electronic device, and method for forming metal pattern | 东曹株式会社 | 2023-05-23 | — | — | CN | claimed |
| US-20230150919-A1 | Method for Producing Mono-Cross-Coupled Aromatic Compound Having Leaving Group | NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (JP) | 2023-05-18 | — | — | US | claimed |
| CN-111836849-B | Process for producing fibers, films and moldings of polybenzazole polymer (P) | 巴斯夫欧洲公司 | 2023-04-07 | — | — | CN | claimed |
| WO-1999019419-A1 | TRYPTICENE DERIVATIVES AND THEIR USE IN OPTOELECTRONIC DEVICES, IN PARTICULAR AS ELECTROLUMINESCENT MATERIALS | AXIVA GMBH (DE) | 1999-04-22 | — | — | WO | claimed |
| US-5589309-A | Electrophotographic photoreceptor containing perylenes | KONICA CORPORATION (JP) | 1996-12-31 | — | — | US | claimed |
| EP-0695972-A1 | Electrophotographic photoreceptor | KONICA CORPORATION (JP) | 1996-02-07 | — | — | EP | claimed |
| US-5464926-A | Synthesis and polymerization of oligomeric multiple aromatic ether-containing phthalonitriles | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1995-11-07 | — | — | US | claimed |
| US-5352760-A | Polymerization of oligomeric multiple aromatic ether-containing phthalonitriles | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1994-10-04 | — | — | US | claimed |
| US-5338637-A | High in photosensitivity, low in residual potential and high in photoreception repsonse speed | KONICA CORPORATION (JP) | 1994-08-16 | — | — | US | claimed |
| US-5312707-A | Compositions for images | RICOH COMPANY, LTD. (JP) | 1994-05-17 | — | — | US | claimed |
| US-4282354-A | PHOTOCONDUCTORS | EASTMAN KODAK COMPANY (US) | 1981-08-04 | — | — | US | claimed |
| US-4255506-A | A PHOTOSENSITIVE ORGANIC PIGMENT CONTAINING ONE OR MORE VINYL GROUPS AND RING(S) OF BENZENE, NAPHTHALENE, ANTHRACENE, AND/OR DIBENZOTHIENE; COPIERS | EASTMAN KODAK COMPANY (US) | 1981-03-10 | — | — | US | claimed |
| US-4165984-A | UNSATURATED COMPOUND | EASTMAN KODAK COMPANY (US) | 1979-08-28 | — | — | US | claimed |