SCHEMBL3468211

SCHEMBL3468211

CCCN(CCC)C(=O)N(CCC)CCC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.57
CA9 Q16790 5/20 0.57
CA2 P00918 3/20 0.57
TSHR P16473 2/20 0.52
MAPK1 P28482 1/20 0.52
ALDH1A1 P00352 3/20 0.48
HPGD P15428 1/20 0.48
CA1 P00915 5/20 0.48
TP53 P04637 2/20 0.46
POLB P06746 1/20 0.39
APEX1 P27695 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CES2 O00748 2/20 0.38
CES1 P23141 2/20 0.38
MLYCD O95822 1/20 0.38
MMP1 P03956 1/20 0.37
MMP2 P08253 1/20 0.37
MMP3 P08254 1/20 0.37
MMP8 P22894 1/20 0.37
P2RX1 P51575 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL29204690 0.97 CA12 (0.55) CA12CA9CA2TSHRMAPK1
SCHEMBL3468531 0.91 CA12 (0.50) CA12CA9CA2TSHRMAPK1
SCHEMBL7526100 0.85 CA12 (0.50) CA12CA9CA2TSHRMAPK1
SCHEMBL20625246 0.84 CA12 (0.50) CA12CA9CA2TSHRMAPK1
SCHEMBL11412702 0.83 CA12 (0.48) CA12CA9CA2TSHRMAPK1
SCHEMBL17192945 0.83 CA12 (0.43) CA12CA9CA2TSHRMAPK1
SCHEMBL14229677 0.83 CA12 (0.57) CA12CA9CA2TSHRMAPK1
SCHEMBL182567 0.81 CA1 (0.61) CA12CA9CA2ALDH1A1HPGD
SCHEMBL11527911 0.81 CA12 (0.46) CA12CA9CA2TSHRMAPK1
SCHEMBL5827268 0.79 CA12 (0.52) CA12CA9CA2ALDH1A1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250297039-A1 OLEFIN POLYMERIZATION CATALYST COMPONENTS CONTAINING DIGLYCIDYLESTER COMPONENTS AND ITS USE FOR THE PRODUCTION OF POLYPROPYLENE HAVING HIGH ISOTACTICITY AT HIGH MELT FLOW RATE FORMOSA PLASTICS CORP USA (US) 2025-09-25 US claimed
US-20250115686-A1 OLEFIN POLYMERIZATION CATALYST COMPONENTS CONTAINING SILANE AND PROCESS FOR THE PRODUCTION OF POLYPROPYLENE HAVING HIGH ISOTACTICITY AT HIGH MELT FLOW RATE FORMOSA PLASTICS CORP USA (US) 2025-04-10 US claimed
US-20250066514-A1 CATALYSTS COMPONENT AND PROCESS FOR THE PRODUCTION OF POLYPROPYLENE HAVING HIGH MELT FLOW RATE WITH HIGH ISOTACTICITY FORMOSA PLASTICS CORP USA (US) 2025-02-27 US claimed
EP-1862198-B1 Brightening and/or dyeing agent with urea derivatives HENKEL AG & CO KGAA (DE) 2017-04-05 EP claimed
US-20170015891-A1 AQUEOUS SOLUTION AND METHOD FOR USE THEREOF SCHLUMBERGER TECHNOLOGY CORP (US) 2017-01-19 US claimed
US-20150122485-A1 AQUEOUS SOLUTION AND METHOD FOR USE THEREOF SCHLUMBERGER TECHNOLOGY CORPORATION (US) 2015-05-07 US claimed
US-20150122499-A1 AQUEOUS SOLUTION AND METHOD FOR USE THEREOF SCHLUMBERGER TECHNOLOGY CORPORATION (US) 2015-05-07 US claimed
CN-1288132-C Chemical synthesis of 1-chloroformyl succinimide UNIV ZHEJIANG TECHNOLOGY (CN) 2006-12-06 CN claimed
CN-1566090-A Chemical synthesis of 1-chloroformyl succinimide UNIV ZHEJIANG TECHNOLOGY (CN) 2005-01-19 CN claimed
US-20250297039-A1 OLEFIN POLYMERIZATION CATALYST COMPONENTS CONTAINING DIGLYCIDYLESTER COMPONENTS AND ITS USE FOR THE PRODUCTION OF POLYPROPYLENE HAVING HIGH ISOTACTICITY AT HIGH MELT FLOW RATE FORMOSA PLASTICS CORP USA (US) 2025-09-25 US disclosed
US-20250270480-A1 PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR TOKYO OHKA KOGYO CO., LTD. (JP) 2025-08-28 US disclosed
US-20250270474-A1 PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR TOKYO OHKA KOGYO CO., LTD. (JP) 2025-08-28 US disclosed
US-20250201546-A1 METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-06-19 US disclosed
US-20250140549-A1 PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD, (JP) 2025-05-01 US disclosed
US-4564514-A Process for the production of water-free organic hydrogen peroxide solution DEGUSSA AKTIENGESELLSCHAFT (DE) 1986-01-14 US disclosed
US-4551562-A Process for the production of dihydroxybenzenes DEGUSSA AKTIENGESELLSCHAFT (DE) 1985-11-05 US disclosed
US-4428923-A Continuous process for the production of hydrogen peroxide according to the anthraquinone process DEGUSSA AKTIENGESELLSCHAFT (DE) 1984-01-31 US disclosed
US-4400329-A Process for the manufacture of thiochlorformates SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) 1983-08-23 US disclosed
EP-0083096-A2 Production of urethane compounds Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-07-06 EP disclosed
US-4090024-A Process for the production of skatylhydantoin DEUTSCHE GOLD- UND SILBER-SCHEIDEANSTALT VORMALS ROESSLER (DT) 1978-05-16 US disclosed