SCHEMBL346936

SCHEMBL346936

O=C(O)c1ccc2c(c1C(=O)O)c(C(=O)O)c(C(=O)O)c1ccccc12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
WDR5 P61964 1/20 0.43
LDHA P00338 1/20 0.42
ALDH1A1 P00352 2/20 0.41
CYP1A2 P05177 2/20 0.41
ALOX15 P16050 1/20 0.41
KDM4E B2RXH2 3/20 0.41
HSD17B10 Q99714 3/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
HPGD P15428 2/20 0.41
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
GLA P06280 1/20 0.41
CYP2C19 P33261 1/20 0.41
CDC25B P30305 3/20 0.41
TDP1 Q9NUW8 1/20 0.40
RXFP1 Q9HBX9 1/20 0.39
PARP1 P09874 1/20 0.39
GPR35 Q9HC97 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20873404 0.91 WDR5 (0.44) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL19177352 0.90 WDR5 (0.47) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL17907061 0.89 WDR5 (0.43) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL471822 0.84 CYP1A2 (0.48) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL9505995 0.80 CYP1A2 (0.61) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL202564 0.80 CYP1A2 (0.50) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL27990719 0.78 PARP1 (0.35) WDR5LDHAALDH1A1CYP1A2ALOX15
SCHEMBL183135 0.78 WDR5 (0.61) WDR5LDHAALDH1A1CYP1A2KDM4E
SCHEMBL31613859 0.78 WDR5 (0.61) WDR5LDHAALDH1A1CYP1A2KDM4E
SCHEMBL11928243 0.78 WDR5 (0.61) WDR5LDHAALDH1A1CYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021118671-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY (US) 2021-06-17 WO claimed
US-20210179800-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY 2021-06-17 US claimed
CN-118063769-A Polyimide resin 住友化学株式会社 2024-05-24 CN disclosed
WO-2024071066-A1 METAL-CLAD LAMINATED PLATE 日鉄ケミカル&マテリアル株式会社 2024-04-04 WO disclosed
CN-117794048-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2024-03-29 CN disclosed
CN-113402882-B Composition for forming release layer 日产化学工业株式会社 2024-02-06 CN disclosed
CN-111746080-B Metal-clad laminate and circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-115971017-B Method for producing polyimide film, method for producing metal-clad laminate, and method for producing circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-117279198-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2023-12-22 CN disclosed
CN-117210002-A Resin film, coverlay film, circuit board, resin-coated copper foil, metal-clad laminate, and multilayer circuit board 日铁化学材料株式会社 2023-12-12 CN disclosed
CN-117067718-A Metal-clad laminate and circuit board 日铁化学材料株式会社 2023-11-17 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
US-5350663-A Construction of electrical circuits and protective or insulating layers for electronic components BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) 1994-09-27 US disclosed
EP-0573866-A1 Method for forming patterned layers of heat-resistant polycondensates BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-15 EP disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed
US-5238784-A PHOTOSENSITIVE RESIN COMPOSITION WITH POLYAMIC ACID POLYMER SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-08-24 US disclosed
US-5206337-A Heat resistance, moldability, workability SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-04-27 US disclosed
EP-0456512-A2 Polyimidesiloxane oligomer SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-11-13 EP disclosed
EP-0430220-A2 Photosensitive resin composition and semiconductor apparatus using it SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed
EP-0430221-A2 Photosensitive resin composition SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed