SCHEMBL3473008

SCHEMBL3473008

C=Cc1ccccc1C(CC)(CC)CN

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
TAAR1 Q96RJ0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9779127 0.86 ALDH1A1 (0.33) ALDH1A1
SCHEMBL9779177 0.83 ALDH1A1 (0.32) ALDH1A1
SCHEMBL9779039 0.81 CNR1 (0.31) ALDH1A1
SCHEMBL9779362 0.81 CNR1 (0.31) ALDH1A1
SCHEMBL9779181 0.81 CNR1 (0.31) ALDH1A1
SCHEMBL3477029 0.78 TAAR1 (0.45) ALDH1A1TAAR1
SCHEMBL3470945 0.78 ALDH1A1 (0.38) ALDH1A1
SCHEMBL2789090 0.76 ALDH1A1 (0.39) ALDH1A1
SCHEMBL650917 0.76 TSHR (0.48) ALDH1A1TAAR1
SCHEMBL30540422 0.76 ALDH1A1 (0.39) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2006110540-A2 ANTIMICROBIAL POLYMER COATINGS AND A METHOD PRODUCING THEM VIA CHEMICAL VAPOUR DEPOSITION MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2006-10-19 WO claimed
US-20060228966-A1 Chemical vapor deposition of antimicrobial polymer coatings MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2006-10-12 US claimed
EP-2872585-B1 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS CABOT MICROELECTRONICS CORP (US) 2020-09-09 EP disclosed
US-9633863-B2 Compositions and methods for selective polishing of silicon nitride materials CABOT MICROELECTRONICS CORPORATION (US) 2017-04-25 US disclosed
EP-2697330-B1 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS CABOT MICROELECTRONICS CORP (US) 2015-10-14 EP disclosed
US-8808573-B2 Compositions and methods for selective polishing of silicon nitride materials CABOT MICROELECTRONICS CORPORATION (US) 2014-08-19 US disclosed
EP-2697330-A2 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS Cabot Microelectronics Corporation (US) 2014-02-19 EP disclosed
US-20140017892-A1 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS CMC MATERIALS LLC 2014-01-16 US disclosed
US-20120264304-A1 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS CMC MATERIALS LLC 2012-10-18 US disclosed
WO-2012142374-A2 COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF SILICON NITRIDE MATERIALS CABOT MICROELECTRONICS CORPORATION (US) 2012-10-18 WO disclosed
US-20100303877-A1 Controlled Release Hydrogel Films BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2010-12-02 US disclosed
US-7563734-B2 Chemical vapor deposition of antimicrobial polymer coatings MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2009-07-21 US disclosed
WO-2006110540-A2 ANTIMICROBIAL POLYMER COATINGS AND A METHOD PRODUCING THEM VIA CHEMICAL VAPOUR DEPOSITION MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2006-10-19 WO disclosed
US-20060228966-A1 Chemical vapor deposition of antimicrobial polymer coatings MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2006-10-12 US disclosed
US-6558873-B1 Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum FUJI PHOTO FILM CO., LTD. (JP) 2003-05-06 US disclosed
EP-1091251-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-04-11 EP disclosed
US-5015551-A Resin particles dispersed in a dielectric nonaqueous solvent for making printing plates or sheets FUJI PHOTO FILM CO., LTD. (JP) 1991-05-14 US disclosed