Methane

Methane

SCHEMBL3473088

C.[GeH4].[Ta]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL264245 0.82
Methane SCHEMBL2733621 0.82
SCHEMBL27633066 0.82
SCHEMBL714871 0.82
Methane SCHEMBL68528 0.82
Methane SCHEMBL30549043 0.82
Methane SCHEMBL23458654 0.67
Methane SCHEMBL5573690 0.67
Methane SCHEMBL17747999 0.67
Methane SCHEMBL20952335 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8680629-B2 Control of flatband voltages and threshold voltages in high-k metal gate stacks and structures for CMOS devices INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-25 US claimed
US-8748991-B2 Control of flatband voltages and threshold voltages in high-k metal gate stacks and structures for CMOS devices INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-06-10 US disclosed
US-8680629-B2 Control of flatband voltages and threshold voltages in high-k metal gate stacks and structures for CMOS devices INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-25 US disclosed
US-20120286338-A1 CONTROL OF FLATBAND VOLTAGES AND THRESHOLD VOLTAGES IN HIGH-K METAL GATE STACKS AND STRUCTURES FOR CMOS DEVICES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-15 US disclosed
US-20100308412-A1 CONTROL OF FLATBAND VOLTAGES AND THRESHOLD VOLTAGES IN HIGH-K METAL GATE STACKS AND STRUCTURES FOR CMOS DEVICES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-12-09 US disclosed