⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23175045 | 0.87 | — | — | |
| SCHEMBL797868 | 0.82 | — | — | |
| SCHEMBL3747862 | 0.80 | — | — | |
| SCHEMBL23175140 | 0.79 | — | — | |
| SCHEMBL3738032 | 0.76 | — | — | |
| SCHEMBL23441660 | 0.75 | — | — | |
| SCHEMBL4200508 | 0.75 | — | — | |
| SCHEMBL23175139 | 0.75 | — | — | |
| SCHEMBL2780876 | 0.73 | — | — | |
| SCHEMBL128990 | 0.73 | PPM1B (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024158026-A1 | PHOTOSENSITIVE COMPOSITION FOR FORMING HOLOGRAM LAYER | 大日本印刷株式会社 | 2024-08-02 | — | — | WO | disclosed |
| CN-114616299-A | Ultraviolet-curable polyorganosiloxane composition and use thereof | 陶氏东丽株式会社 | 2022-06-10 | — | — | CN | disclosed |
| CN-113518809-A | Two-part cyanoacrylate/cationically curable adhesive systems | 汉高知识产权控股有限责任公司 | 2021-10-19 | — | — | CN | disclosed |
| CN-112789301-A | Two-part cyanoacrylate curable adhesive systems | 汉高知识产权控股有限责任公司 | 2021-05-11 | — | — | CN | disclosed |
| CN-112789302-A | Two-part cyanoacrylate curable adhesive systems | 汉高股份有限及两合公司 | 2021-05-11 | — | — | CN | disclosed |
| WO-2021066084-A1 | ULTRAVIOLET-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND APPLICATION FOR SAME | ダウ・東レ株式会社 | 2021-04-08 | — | — | WO | disclosed |
| CN-112424120-A | Composite material | 株式会社艾迪科 | 2021-02-26 | — | — | CN | disclosed |
| WO-2010077606-A1 | REDOX-INITIATED CATIONIC POLYMERIZATION USING VAPOR-STATE REDUCING AGENTS | RENSSELAER POLYTECHNIC INSTITUTE (US) | 2010-07-08 | — | — | WO | disclosed |
| EP-1151021-A4 | INITIATOR COMPOSITIONS AND METHODS FOR THEIR SYNTHESIS AND USE | CRIVELLO JAMES V (US) | 2002-10-02 | — | — | EP | disclosed |
| EP-1151021-A1 | INITIATOR COMPOSITIONS AND METHODS FOR THEIR SYNTHESIS AND USE | CRIVELLO, James V. (US) | 2001-11-07 | — | — | EP | disclosed |
| WO-2000034348-A1 | INITIATOR COMPOSITIONS AND METHODS FOR THEIR SYNTHESIS AND USE | CRIVELLO JAMES V (US) | 2000-06-15 | — | — | WO | disclosed |
| US-5391678-A | Polymerizing a mixture of polyene, silicon compound or polysiloxane having at least two SiH groups and an epoxy compound; hydrosilation; mechanical properties; electronics; molding materials; composites; prepregs; adhesives; coatings | HERCULES INCORPORATED (US) | 1995-02-21 | — | — | US | disclosed |