⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3475571 | 1.00 | — | — | |
| SCHEMBL9976185 | 1.00 | — | — | |
| SCHEMBL1639210 | 1.00 | — | — | |
| SCHEMBL13923825 | 0.89 | — | — | |
| SCHEMBL20345782 | 0.87 | — | — | |
| SCHEMBL12725247 | 0.87 | — | — | |
| SCHEMBL13133223 | 0.87 | — | — | |
| SCHEMBL14424563 | 0.82 | — | — | |
| SCHEMBL41538 | 0.82 | — | — | |
| SCHEMBL16329397 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8562953-B2 | Dendritic polymers and magnetic resonance imaging contrast agent employing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2013-10-22 | — | — | US | disclosed |
| US-8513448-B2 | Cyclic siloxane compound, a material for forming Si-containing film, and its use | TOSOH CORPORATION (JP) | 2013-08-20 | — | — | US | disclosed |
| US-20130030139-A1 | DENDRITIC POLYMERS AND MAGNETIC RESONANCE IMAGING CONTRAST AGENT EMPLOYING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2013-01-31 | — | — | US | disclosed |
| US-8303937-B2 | Dendritic polymers and magnetic resonance imaging contrast agent employing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2012-11-06 | — | — | US | disclosed |
| EP-2256123-A2 | Cyclic siloxane compound, a material for forming Si-containing film, and its use | Tosoh Corporation (JP) | 2010-12-01 | — | — | EP | disclosed |
| US-20100052114-A1 | CYCLIC SILOXANE COMPOUND, A MATERIAL FOR FORMING SI-CONTAINING FILM, AND ITS USE | TOSOH CORPORATION (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20090169481-A1 | DENDRITIC POLYMERS AND MAGNETIC RESONANCE IMAGING CONTRAST AGENT EMPLOYING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2009-07-02 | — | — | US | disclosed |
| EP-1845100-A1 | CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF | Tosoh Corporation (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070178319-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1564269-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-20040216641-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |