SCHEMBL3475786

SCHEMBL3475786

C=CCCC[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5909792 0.90
SCHEMBL6418651 0.87 TSHR (0.52)
SCHEMBL12609397 0.87 TSHR (0.52)
SCHEMBL29156747 0.87 TSHR (0.52)
SCHEMBL692882 0.87
SCHEMBL5909735 0.87 TSHR (0.52)
SCHEMBL29255850 0.87 TSHR (0.52)
SCHEMBL9559196 0.87
Hydrochloric Acid SCHEMBL6294447 0.84 TSHR (0.43)
Hydrochloric Acid SCHEMBL7560132 0.82 TSHR (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008138934-A2 A METHOD FOR THE MANUFACTURE OF PATTERNED FUNCTIONAL MONOLAYER STRUCTURES AND PRODUCTS THEREOF Westfälische Wilhelms-Universität Münster (DE) 2008-11-20 WO claimed
JP-62073930-A None JP disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
CN-117355632-A Method for producing planarizing film, material for planarizing film, and planarizing film 东曹株式会社 2024-01-05 CN disclosed
CN-116194493-A Metallocene complexes and catalysts prepared therefrom 博里利斯股份公司 2023-05-30 CN disclosed
WO-2022255290-A1 METHOD FOR MANUFACTURING PLANARIZING FILM, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM 東ソー株式会社 2022-12-08 WO disclosed
WO-2022230944-A1 PLANARIZING FILM MANUFACTURING METHOD, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM 東ソー株式会社 2022-11-03 WO disclosed
US-20220220338-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-14 US disclosed
US-20220213348-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-07 US disclosed
US-11377522-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-05 US disclosed
EP-3971229-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2022-03-23 EP disclosed
EP-3957678-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER Tokyo Ohka Kogyo Co., Ltd. (JP) 2022-02-23 EP disclosed
US-20200362115-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA-BASED COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2020-11-19 US disclosed
US-8182868-B2 Encapsulation of particulate contamination MAXTOR CORPORATION (US) 2012-05-22 US disclosed
US-20100178422-A1 ENCAPSULATION OF PARTICULATE CONTAMINATION MAXTOR CORPORATION (US) 2010-07-15 US disclosed
WO-2008138934-A2 A METHOD FOR THE MANUFACTURE OF PATTERNED FUNCTIONAL MONOLAYER STRUCTURES AND PRODUCTS THEREOF Westfälische Wilhelms-Universität Münster (DE) 2008-11-20 WO disclosed
CN-1289343-A Improved olefin polymerization process DOW CHEMICAL CO (US) 2001-03-28 CN disclosed
JP-S6273930-A STICKING METHOD FOR SYNTHETIC FIBER WOVEN CLOTH AND SILICONE RUBBER BANDO CHEM IND LTD 1987-04-04 JP disclosed
JP-S06273930-A 0001-01-01 JP disclosed