⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9100681 | 0.74 | — | — | |
| SCHEMBL90103 | 0.70 | — | — | |
| SCHEMBL17102757 | 0.67 | TSHR (0.32) | — | |
| SCHEMBL104329 | 0.64 | — | — | |
| SCHEMBL10005572 | 0.64 | SLC6A4 (0.42) | — | |
| SCHEMBL13725538 | 0.64 | SLC6A4 (0.42) | — | |
| SCHEMBL20389467 | 0.62 | TDP1 (0.41) | — | |
| SCHEMBL25168535 | 0.62 | — | — | |
| SCHEMBL13240336 | 0.61 | — | — | |
| SCHEMBL13716925 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| US-20250166990-A1 | METHOD FOR FORMING INSULATING FILM, AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2025-05-22 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| US-20240321571-A1 | INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2024-09-26 | — | — | US | claimed |
| EP-3347504-B1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| US-20240014036-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC | 2024-01-11 | — | — | US | claimed |
| WO-2023201271-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2023-10-19 | — | — | WO | claimed |
| EP-4240886-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| US-11732351-B2 | Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films | VERSUM MATERIALS US, LLC (US) | 2023-08-22 | — | — | US | claimed |
| WO-2022119865-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2022119860-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| US-20210388489-A1 | Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films | VERSUM MATERIALS US, LLC (US) | 2021-12-16 | — | — | US | claimed |
| US-20180274097-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM | VERSUM MATERIALS US, LLC | 2018-09-27 | — | — | US | claimed |
| US-20180245215-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MATERIALS US, LLC | 2018-08-30 | — | — | US | claimed |
| EP-3347504-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | Air Products and Chemicals, Inc. (US) | 2018-07-18 | — | — | EP | claimed |
| EP-2251899-B1 | Dielectric barrier deposition using nitrogen containing precursor | VERSUM MAT US LLC (US) | 2018-03-28 | — | — | EP | claimed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | claimed |
| EP-2924143-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-30 | — | — | EP | claimed |