⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13232810 | 0.97 | — | — | |
| SCHEMBL13007312 | 0.94 | — | — | |
| SCHEMBL19999739 | 0.85 | — | — | |
| SCHEMBL332625 | 0.85 | — | — | |
| SCHEMBL680313 | 0.82 | — | — | |
| SCHEMBL18355484 | 0.82 | — | — | |
| SCHEMBL12387143 | 0.80 | — | — | |
| SCHEMBL3484095 | 0.80 | — | — | |
| SCHEMBL3483256 | 0.80 | — | — | |
| SCHEMBL3483929 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109661435-B | Curable resin composition, cured product thereof, and semiconductor device | 日亚化学工业株式会社 | 2022-04-12 | — | — | CN | disclosed |
| US-10947384-B2 | Curable resin composition, cured product thereof, and semiconductor device | DAICEL CORPORATION (JP) | 2021-03-16 | — | — | US | disclosed |
| US-20190218346-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND SEMICONDUCTOR DEVICE | DAICEL CORPORATION (JP) | 2019-07-18 | — | — | US | disclosed |
| EP-2057239-B1 | BRANCHED POLYSILOXANE COMPOSITION | MOMENTIVE PERFORMANCE MAT INC (US) | 2015-03-04 | — | — | EP | disclosed |
| EP-2057238-B1 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | MOMENTIVE PERFORMANCE MAT INC (US) | 2012-10-10 | — | — | EP | disclosed |
| US-7649071-B2 | Branched polysiloxane composition | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2010-01-19 | — | — | US | disclosed |
| US-7560167-B2 | branched polysiloxane component; paper release coating; high-speed coating processes | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2009-07-14 | — | — | US | disclosed |
| EP-2057239-A2 | BRANCHED POLYSILOXANE COMPOSITION | Momentive Performance Materials Inc. (US) | 2009-05-13 | — | — | EP | disclosed |
| EP-2057238-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | Momentive Performance Materials Inc. (US) | 2009-05-13 | — | — | EP | disclosed |
| WO-2008140762-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT OF REDUCED MOLECULAR WEIGHT AND VISCOSITY | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-11-20 | — | — | WO | disclosed |
| US-20080276836-A1 | Composition containing anti-misting component of reduced molecular weight and viscosity | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-11-13 | — | — | US | disclosed |
| US-20080281055-A1 | Branched polysiloxane of reduced molecular weight and viscosity | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-11-13 | — | — | US | disclosed |
| WO-2008027497-A2 | BRANCHED POLYSILOXANE COMPOSITION | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027494-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080058491-A1 | Branched polysiloxane composition | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| US-20080058479-A1 | Composition containing anti-misting component | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| EP-1510520-B1 | Preparation of branched siloxane | SHINETSU CHEMICAL CO (JP) | 2006-07-26 | — | — | EP | disclosed |
| US-6943264-B2 | Preparation of branched siloxane | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2005-09-13 | — | — | US | disclosed |
| US-20050049427-A1 | Preparation of branched siloxane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-03 | — | — | US | disclosed |
| EP-1510520-A1 | Preparation of branched siloxane | Shin-Etsu Chemical Co., Ltd. (JP) | 2005-03-02 | — | — | EP | disclosed |