Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | PSMB5 | P28074 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | HCRTR2 | O43614 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | PPARA | Q07869 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | PSMB8 | P28062 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL675684 | 0.87 | SLC6A2 (0.44) | — | |
| SCHEMBL9281134 | 0.85 | SMN1; SMN2 (0.46) | SMN1; SMN2MEN1KMT2APSMB5PKM | |
| SCHEMBL3482608 | 0.83 | SMN1; SMN2 (0.41) | SMN1; SMN2MEN1KMT2APKMPPARG | |
| SCHEMBL10489055 | 0.77 | SLC6A2 (0.55) | SMN1; SMN2MEN1KMT2APSMB5PKM | |
| SCHEMBL4973916 | 0.75 | SLC6A2 (0.53) | SMN1; SMN2MEN1KMT2APSMB5PKM | |
| SCHEMBL2844291 | 0.73 | ESR1 (0.53) | SMN1; SMN2MEN1KMT2APSMB5HCRTR2 | |
| SCHEMBL703561 | 0.72 | LMNA (0.46) | LMNAPOLB | |
| SCHEMBL28549206 | 0.72 | PPARG (0.49) | SMN1; SMN2MEN1KMT2APSMB5PKM | |
| SCHEMBL28543673 | 0.72 | NPSR1 (0.52) | MEN1KMT2APPARGPPARAPOLB | |
| SCHEMBL9771341 | 0.72 | LMNA (0.48) | SMN1; SMN2MEN1KMT2APSMB5PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |