⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6275468 | 0.84 | — | — | |
| SCHEMBL14633833 | 0.82 | — | — | |
| SCHEMBL4470668 | 0.80 | TSHR (0.41) | — | |
| SCHEMBL10847637 | 0.80 | TSHR (0.41) | — | |
| SCHEMBL3676011 | 0.77 | — | — | |
| SCHEMBL282677 | 0.77 | — | — | |
| SCHEMBL3208459 | 0.76 | — | — | |
| Propene SCHEMBL27922594 | 0.72 | TSHR (0.30) | — | |
| SCHEMBL27538440 | 0.72 | — | — | |
| Trimethylammonium SCHEMBL27993230 | 0.70 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119930872-A | Catalyst system, prepolymerized catalyst composition and olefin polymerization process | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119930869-A | Auxiliary agent for olefin polymerization, olefin catalyst system, prepolymerized catalyst composition and olefin polymerization method | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-113754802-B | Catalyst system for olefin polymerization reaction and prepolymerization catalyst composition | 中国石油化工股份有限公司 | 2023-03-31 | — | — | CN | claimed |
| CN-110938157-B | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-111793165-B | Seawater-eroded fair-faced concrete additive and preparation method thereof | 中铁大桥局集团第四工程有限公司 | 2022-06-28 | — | — | CN | claimed |
| CN-113754802-A | Catalyst system for olefin polymerization reaction and prepolymerization catalyst composition | 中国石油化工股份有限公司 | 2021-12-07 | — | — | CN | claimed |
| CN-111234062-B | Catalyst system for olefin polymerization and use thereof | 中国石油化工股份有限公司 | 2021-08-03 | — | — | CN | claimed |
| CN-110938157-A | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2020-03-31 | — | — | CN | claimed |
| CN-110938162-A | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2020-03-31 | — | — | CN | claimed |
| CN-110938163-A | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2020-03-31 | — | — | CN | claimed |
| US-20250188615-A1 | Gapfill Methods and Processing Assemblies | ASM IP HOLDING B.V. (NL) | 2025-06-12 | — | — | US | disclosed |
| CN-119930872-A | Catalyst system, prepolymerized catalyst composition and olefin polymerization process | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-119930869-A | Auxiliary agent for olefin polymerization, olefin catalyst system, prepolymerized catalyst composition and olefin polymerization method | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| US-12252790-B2 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2025-03-18 | — | — | US | disclosed |
| CN-116023547-B | Catalyst component, catalyst and method for olefin polymerization | 中国石油化工股份有限公司 | 2024-08-06 | — | — | CN | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-101641767-B | Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device | FUJITSU LTD | 2013-10-30 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| CN-1809764-A | Antireflective film | ASAHI CHEMICAL IND (JP) | 2006-07-26 | — | — | CN | disclosed |