Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | LTA4H | P09960 | 2/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.33 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.31 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706115 | 0.96 | TSHR (0.36) | TSHRLTA4HNR1H3PCSK9NAAA | |
| SCHEMBL704073 | 0.92 | TP53 (0.35) | TSHRNR1H3CYP19A1 | |
| SCHEMBL18108087 | 0.90 | KCNH2 (0.41) | NAAASMN1; SMN2HTTCES2CES1 | |
| SCHEMBL18108436 | 0.90 | KCNH2 (0.41) | NAAASMN1; SMN2HTTCES2CES1 | |
| SCHEMBL3482605 | 0.88 | TSHR (0.34) | TSHRLTA4HNR1H3PCSK9NAAA | |
| SCHEMBL18108094 | 0.88 | KCNH2 (0.42) | NAAASMN1; SMN2HTTCES2CES1 | |
| SCHEMBL18108092 | 0.88 | KCNH2 (0.42) | NAAASMN1; SMN2HTTCES2CES1 | |
| SCHEMBL1317397 | 0.88 | KCNH2 (0.42) | NAAASMN1; SMN2HTTCES2CES1 | |
| SCHEMBL707580 | 0.85 | AR (0.41) | NR1H3AR | |
| SCHEMBL27521287 | 0.85 | TLR8 (0.33) | TSHRLTA4HNR1H3PCSK9NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |