Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | HTR2A | P28223 | 1/20 | 0.45 |
| ▸ | SCN1A | P35498 | 1/20 | 0.45 |
| ▸ | HTR2B | P41595 | 1/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.45 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.45 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.45 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.45 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL612358 | 0.95 | ALDH1A1 (0.44) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL2762716 | 0.89 | ALDH1A1 (0.40) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL16714796 | 0.86 | ALDH1A1 (0.50) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL3482394 | 0.85 | ALDH1A1 (0.56) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL16612469 | 0.83 | ALDH1A1 (0.43) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL16714744 | 0.81 | HRH3 (0.46) | SMN1; SMN2ALDH1A1MAPK1CYP1A2HRH3 | |
| SCHEMBL4059392 | 0.79 | — | — | |
| SCHEMBL4065756 | 0.79 | CXCR4 (0.43) | SMN1; SMN2SIGMAR1CHRM2CHRM1HRH3 | |
| SCHEMBL1859824 | 0.77 | TSHR (0.37) | KEAP1SMN1; SMN2ALDH1A1SIGMAR1MAPK1 | |
| SCHEMBL21373219 | 0.76 | PAOX (0.41) | ALDH1A1SIGMAR1HRH3USP2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10570259-B2 | Composition and formed article | JSR CORPORATION (JP) | 2020-02-25 | — | — | US | disclosed |
| US-20180258239-A1 | COMPOSITION AND FORMED ARTICLE | JSR CORPORATION (JP) | 2018-09-13 | — | — | US | disclosed |
| EP-3345969-A1 | COMPOSITION AND MOLDED OBJECT | JSR Corporation (JP) | 2018-07-11 | — | — | EP | disclosed |
| US-9862812-B2 | Composition containing nitrogen-containing organoxysilane compound and method for making the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| EP-2876111-B1 | Composition containing nitrogen-containing organoxysilane compound and method for making the same | SHINETSU CHEMICAL CO (JP) | 2017-09-20 | — | — | EP | disclosed |
| EP-2876111-A1 | Composition containing nitrogen-containing organoxysilane compound and method for making the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| US-20150135996-A1 | COMPOSITION CONTAINING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND AND METHOD FOR MAKING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |