⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4281440 | 0.82 | ADRB2 (0.39) | — | |
| SCHEMBL703982 | 0.81 | — | — | |
| SCHEMBL706740 | 0.81 | — | — | |
| SCHEMBL1582745 | 0.79 | — | — | |
| SCHEMBL25405865 | 0.77 | — | — | |
| SCHEMBL706737 | 0.77 | — | — | |
| SCHEMBL234381 | 0.77 | — | — | |
| SCHEMBL704380 | 0.77 | — | — | |
| SCHEMBL13089109 | 0.77 | — | — | |
| SCHEMBL11805648 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114616652-A | Monoalkoxysilanes and dense organosilica films prepared therefrom | 弗萨姆材料美国有限责任公司 | 2022-06-10 | — | — | CN | claimed |
| WO-2010082710-A1 | METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2010-07-22 | — | — | WO | claimed |
| CN-119874207-A | Organically modified metal oxide or metalloid oxide polymer films | 巴斯夫欧洲公司 | 2025-04-25 | — | — | CN | disclosed |
| US-12240989-B2 | Organomodified metal oxide or metalloid oxide polymer film | BASF SE (DE) | 2025-03-04 | — | — | US | disclosed |
| US-12187914-B2 | Easy to clean coating | BASF SE (DE) | 2025-01-07 | — | — | US | disclosed |
| EP-3755672-B1 | ORGANOMODIFIED METAL OXIDE OR METALLOID OXIDE POLYMER FILM | BASF SE (DE) | 2024-08-07 | — | — | EP | disclosed |
| WO-2023198748-A1 | PROCESS FOR PREPARING AN ABRASION RESISTANT COATING | OPTITUNE OY (FI) | 2023-10-19 | — | — | WO | disclosed |
| US-20220010170-A1 | EASY TO CLEAN COATING | BASF SE (DE) | 2022-01-13 | — | — | US | disclosed |
| EP-3880371-A1 | EASY TO CLEAN COATING | BASF SE (DE) | 2021-09-22 | — | — | EP | disclosed |
| CN-113015581-A | Easy-to-clean coating | 巴斯夫欧洲公司 | 2021-06-22 | — | — | CN | disclosed |
| CN-108350173-B | Method for producing polyalkylene ether-modified polysiloxanes and use thereof | 巴斯夫欧洲公司 | 2021-03-05 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-20150093655-A1 | IONIC COMPOUNDS HAVING A SILYLOXY GROUP | HYDRO-QUEBEC (CA) | 2015-04-02 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| WO-2010082710-A1 | METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2010-07-22 | — | — | WO | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |