Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIG1 | P18858 | 1/20 | 0.71 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.59 |
| ▸ | RAB9A | P51151 | 3/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.59 |
| ▸ | MAPT | P10636 | 3/20 | 0.59 |
| ▸ | NPC1 | O15118 | 2/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.59 |
| ▸ | HPGD | P15428 | 2/20 | 0.59 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.56 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 1/20 | 0.56 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.56 |
| ▸ | RELA | Q04206 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | STS | P08842 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29963711 | 1.00 | LIG1 (0.71) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL23126854 | 0.90 | PNLIP (0.62) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL29499085 | 0.89 | LIG1 (0.87) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL21802003 | 0.89 | LIG1 (0.87) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL11189754 | 0.87 | AKR1C3 (0.84) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| Methyl Alcohol SCHEMBL28795496 | 0.83 | LIG1 (0.70) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL28027482 | 0.83 | LIG1 (0.77) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 | |
| SCHEMBL1568564 | 0.83 | LIG1 (1.00) | LIG1ALDH1A1RAB9ASMN1; SMN2MAPT | |
| SCHEMBL29512266 | 0.83 | LIG1 (1.00) | LIG1ALDH1A1RAB9ASMN1; SMN2MAPT | |
| Ethane SCHEMBL28106767 | 0.83 | LIG1 (0.70) | LIG1AKR1C3ALDH1A1RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116940637-A | Curable silicone composition, encapsulant, and optical semiconductor device | 杜邦东丽特殊材料株式会社 | 2023-10-24 | — | — | CN | disclosed |
| US-9983490-B2 | Electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9983490-B2 | Electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9811012-B2 | Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus and process for producing electrophotographic photosensitive member | CANON KABUSHIKI KAISHA (JP) | 2017-11-07 | — | — | US | disclosed |
| US-9811012-B2 | Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus and process for producing electrophotographic photosensitive member | CANON KABUSHIKI KAISHA (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20170285499-A1 | ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170285499-A1 | ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170090309-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, ELECTROPHOTOGRAPHIC APPARATUS AND PROCESS FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER | CANON KABUSHIKI KAISHA (JP) | 2017-03-30 | — | — | US | disclosed |
| US-20170090309-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, ELECTROPHOTOGRAPHIC APPARATUS AND PROCESS FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER | CANON KABUSHIKI KAISHA (JP) | 2017-03-30 | — | — | US | disclosed |
| CN-105209974-A | Novolac-resin-containing composition for forming resist underlayer film using bisphenol aldehyde | NISSAN CHEMICAL IND LTD | 2015-12-30 | — | — | CN | disclosed |
| US-5389641-A | Fused heterocyclic compounds, having angiotensin II antagonistic activity | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0442068-B1 | Benzophenone derivatives and polymers containing phenolic hydroxyl groups | BAYER AG (DE) | 1994-06-08 | — | — | EP | disclosed |
| US-5215994-A | Treating or preventing hypertension or heart failure | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| US-5210092-A | Hypotensive agents | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1993-05-11 | — | — | US | disclosed |
| EP-0518033-A1 | Fused heterocyclic compounds, their production and use | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1992-12-16 | — | — | EP | disclosed |
| EP-0480204-A1 | Imidazole derivatives, potent and selective antagonists of angiotensin II receptor | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1992-04-15 | — | — | EP | disclosed |
| EP-0442068-A2 | Benzophenone derivatives and polymers containing phenolic hydroxyl groups | BAYER AG (DE) | 1991-08-21 | — | — | EP | disclosed |
| EP-0165529-B1 | PROCESS FOR PRODUCING PHENYL METHACRYLATE OR ACRYLATE | MITSUBISHI RAYON CO., LTD. (JP) | 1987-11-25 | — | — | EP | disclosed |
| EP-0227487-A2 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-07-01 | — | — | EP | disclosed |
| EP-0165529-A1 | Process for producing phenyl methacrylate or acrylate | MITSUBISHI RAYON CO., LTD. (JP) | 1985-12-27 | — | — | EP | disclosed |