SCHEMBL3515513

SCHEMBL3515513

CCC(C)OC(=O)/C=C/C(=O)OC(C)C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 6/20 0.59
CA12 O43570 1/20 0.42
AKR1B10 O60218 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
AKR1B1 P15121 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
TSHR P16473 1/20 0.37
LMNA P02545 3/20 0.35
ATM Q13315 1/20 0.34
MAPT P10636 2/20 0.34
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
HTT P42858 1/20 0.34
RECQL P46063 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7562770 1.00 HCAR2 (0.59) HCAR2CA12AKR1B10CA1CA2
SCHEMBL1062134 0.93 HCAR2 (0.48) HCAR2CA12AKR1B10CA1CA2
SCHEMBL510759 0.93 HCAR2 (0.48) HCAR2CA12AKR1B10CA1CA2
SCHEMBL510760 0.93 HCAR2 (0.48) HCAR2CA12AKR1B10CA1CA2
SCHEMBL1832224 0.85 HCAR2 (0.63) HCAR2TSHRATMMAPTKDM4E
Fumaric Acid SCHEMBL7565352 0.85 HCAR2 (0.63) HCAR2TSHRATMMAPTKDM4E
SCHEMBL451816 0.85 HCAR2 (0.63) HCAR2TSHRATMMAPTKDM4E
SCHEMBL1579344 0.85 HCAR2 (0.63) HCAR2TSHRATMMAPTKDM4E
Fumaric Acid SCHEMBL7565361 0.85 HCAR2 (0.63) HCAR2TSHRATMMAPTKDM4E
Butane SCHEMBL15751306 0.84 HCAR2 (0.67) HCAR2CA12AKR1B10CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8236917-B2 Compound having silsesquioxane skeleton and its polymer JNC CORPORATION (JP) 2012-08-07 US disclosed
US-20100240855-A1 Compound having silsesquioxane skeleton and its polymer JNC CORPORATION (JP) 2010-09-23 US disclosed
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed