SCHEMBL3518399

SCHEMBL3518399

O=S(=O)(c1cccc2cc(O)ccc12)c1cccc2cc(O)ccc12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALPL P05186 1/20 0.61
ALPI P09923 1/20 0.61
ALPG P10696 1/20 0.61
DNMT1 P26358 1/20 0.61
MCL1 Q07820 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
L3MBTL1 Q9Y468 1/20 0.61
CYP1A2 P05177 1/20 0.43
ESR1 P03372 7/20 0.43
ESR2 Q92731 7/20 0.43
MPL P40238 1/20 0.42
HTR6 P50406 2/20 0.42
HSD17B1 P14061 1/20 0.42
HSD17B2 P37059 1/20 0.42
HCRTR1 O43613 1/20 0.41
TLR8 Q9NR97 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
CLK1 P49759 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL888245 0.89 MPL (0.49) ALPLALPIALPGDNMT1MCL1
Potassium Ion SCHEMBL28682440 0.84 PTGS1 (0.49) ALPLALPIALPGDNMT1MCL1
SCHEMBL15879779 0.84 DUSP5 (0.50) ALPLALPIALPGDNMT1MCL1
SCHEMBL7196896 0.81 ALPL (0.61) ALPLALPIALPGDNMT1MCL1
SCHEMBL10610440 0.81 ALPL (0.81) ALPLALPIALPGDNMT1MCL1
SCHEMBL4556657 0.81 TSHR (0.52) ALPLALPIALPGDNMT1MCL1
SCHEMBL8509035 0.79 ALPL (0.54) ALPLALPIALPGDNMT1MCL1
SCHEMBL8509349 0.79 ALPL (0.54) ALPLALPIALPGDNMT1MCL1
SCHEMBL1807925 0.76 MPL (0.51) ALPLALPIALPGDNMT1MCL1
SCHEMBL8508718 0.75 ALPL (0.50) ALPLALPIALPGDNMT1MCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7850837-B2 electrochemical graining treatment in hydrochloric acid solution and an alkali etching treatment; aluminum electrodeposition; excellent in press life and scum resistance; recording layer is formed on the grained surface of the support is excellent in all of sensitivity, press life, mechanical strength FUJIFILM CORPORATION (JP) 2010-12-14 US disclosed
US-7232645-B2 Support for lithographic printing plate and presensitized plate FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20060201819-A1 electrochemical graining treatment in hydrochloric acid solution and an alkali etching treatment; aluminum electrodeposition; excellent in press life and scum resistance; recording layer is formed on the grained surface of the support is excellent in all of sensitivity, press life, mechanical strength FUJI PHOTO FILM CO., LTD. 2006-09-14 US disclosed
EP-1442894-B1 Support for lithographic printing plate and presensitized plate and method of treating presensitized plate FUJI PHOTO FILM CO LTD (JP) 2006-08-16 EP disclosed
EP-1273439-B1 Presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2006-05-17 EP disclosed
EP-1452337-A2 Support for lithographic printing plate and presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 2004-09-01 EP disclosed
EP-1442894-A1 Support for lithographic printing plate and presensitized plate and method of treating presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 2004-08-04 EP disclosed
EP-1338436-A2 Aluminum support for lithographic printing plate, method of preparing the same and presensitized plate using the same FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed
EP-1273439-A2 Presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-01-08 EP disclosed