SCHEMBL352012

SCHEMBL352012

C=CCOCOC(=O)C(=C)C(C)(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.40
PKM P14618 1/20 0.40
CYP3A4 P08684 1/20 0.39
ALDH1A1 P00352 4/20 0.38
TSHR P16473 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CHRM2 P08172 4/20 0.37
CHRM4 P08173 4/20 0.37
CHRM1 P11229 4/20 0.37
CHRM3 P20309 4/20 0.37
CHRM5 P08912 3/20 0.37
HDAC3 O15379 1/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36
HDAC2 Q92769 1/20 0.36
HDAC10 Q969S8 1/20 0.36
HDAC11 Q96DB2 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352172 0.86 CYP3A4 (0.41) SMN1; SMN2PKMCYP3A4ALDH1A1TSHR
SCHEMBL353514 0.79 CYP3A4 (0.33) CYP3A4TSHRL3MBTL1
SCHEMBL351308 0.78 TDP1 (0.33) CYP3A4TSHR
SCHEMBL352660 0.76 TDP1 (0.32) TSHR
SCHEMBL351043 0.76 CYP3A4 (0.44) SMN1; SMN2PKMCYP3A4ALDH1A1TSHR
SCHEMBL351175 0.75 TDP1 (0.31) TSHR
Acrylic Acid SCHEMBL25388471 0.74 CYP3A4 (0.35) SMN1; SMN2PKMCYP3A4ALDH1A1TSHR
SCHEMBL350961 0.74 TSHR (0.33) TSHRL3MBTL1
SCHEMBL350915 0.73 CYP3A4 (0.41) SMN1; SMN2PKMCYP3A4ALDH1A1TSHR
SCHEMBL350183 0.73 CYP3A4 (0.41) SMN1; SMN2PKMCYP3A4ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed