SCHEMBL352172

SCHEMBL352172

C=CCOCOC(=O)C(=C)C(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.41
ALDH1A1 P00352 4/20 0.40
TSHR P16473 2/20 0.40
PKM P14618 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HTT P42858 1/20 0.38
HSD17B10 Q99714 1/20 0.36
MAPT P10636 1/20 0.36
KCNN4 O15554 1/20 0.36
LMNA P02545 1/20 0.34
MAPK1 P28482 1/20 0.34
RAB9A P51151 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
NPSR1 Q6W5P4 2/20 0.34
KDM4E B2RXH2 1/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.32
RHOA P61586 1/20 0.32
LIG1 P18858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352012 0.86 SMN1; SMN2 (0.40) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL351043 0.78 CYP3A4 (0.44) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL350915 0.75 CYP3A4 (0.41) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL350183 0.75 CYP3A4 (0.41) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL353514 0.75 CYP3A4 (0.33) CYP3A4TSHRL3MBTL1
Acrylic Acid SCHEMBL25388471 0.74 CYP3A4 (0.35) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL351308 0.73 TDP1 (0.33) CYP3A4TSHR
SCHEMBL751119 0.73 CYP3A4 (0.53) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL30558867 0.72 THRB (0.41) CYP3A4ALDH1A1TSHRPKMSMN1; SMN2
SCHEMBL352660 0.72 TDP1 (0.32) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed