SCHEMBL352105

SCHEMBL352105

C=CCOCC(=C)C(=O)OC1CCC(C(C)(C)C)CC1

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
APOBEC3A P31941 1/20 0.39
APOBEC3G Q9HC16 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
KDM4E B2RXH2 1/20 0.39
HTT P42858 1/20 0.39
CYP19A1 P11511 1/20 0.38
MAPT P10636 2/20 0.37
GAA P10253 1/20 0.35
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
LIPA P38571 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8057709 0.89 APOBEC3A (0.44) APOBEC3AAPOBEC3GSMN1; SMN2KDM4EHTT
SCHEMBL353056 0.85 CYP19A1 (0.34) CYP19A1
SCHEMBL352819 0.83 EPHX1 (0.33) HTTMAPTGAANPC1RAB9A
SCHEMBL351554 0.81 EPHX1 (0.36) HTTCYP19A1MAPTGAANPC1
SCHEMBL16416230 0.78 APOBEC3A (0.46) APOBEC3AAPOBEC3GSMN1; SMN2KDM4EHTT
SCHEMBL19125861 0.77 APOBEC3A (0.44) APOBEC3AAPOBEC3GSMN1; SMN2KDM4EHTT
SCHEMBL19056002 0.74 APOBEC3A (0.43) APOBEC3AAPOBEC3GSMN1; SMN2KDM4EHTT
SCHEMBL23489690 0.74
SCHEMBL23474740 0.73
SCHEMBL439526 0.73 MAPT (0.46) APOBEC3AAPOBEC3GSMN1; SMN2KDM4EHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed