SCHEMBL352819

SCHEMBL352819

C=CCOCC(=C)C(=O)OC1CCCC1

nearest known ligand 0.33

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.33
ALDH1A1 P00352 2/20 0.32
GAA P10253 1/20 0.32
NAAA Q02083 2/20 0.32
CYP2C19 P33261 1/20 0.32
NPC1 O15118 1/20 0.31
MAPT P10636 1/20 0.31
RAB9A P51151 1/20 0.31
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL351554 0.98 EPHX1 (0.36) EPHX1ALDH1A1GAANAAACYP2C19
SCHEMBL353056 0.86 CYP19A1 (0.34)
SCHEMBL1520936 0.84 EPHX1 (0.42) EPHX1NAAACYP2C19HTT
SCHEMBL352105 0.83 APOBEC3A (0.39) GAANPC1MAPTRAB9AHTT
SCHEMBL19837887 0.81 NAAA (0.32) ALDH1A1GAANAAA
SCHEMBL352685 0.80 ALDH1A1 (0.33) ALDH1A1GAANAAANPC1
SCHEMBL352096 0.79 GRIK1 (0.33) EPHX1
SCHEMBL8996569 0.79 EPHX1 (0.38) EPHX1NAAACYP2C19HTT
SCHEMBL20261871 0.79 EPHX1 (0.38) EPHX1NAAACYP2C19HTT
SCHEMBL22325462 0.79 TDP1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed