⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL352436 | 1.00 | — | — | |
| SCHEMBL76752 | 0.82 | — | — | |
| SCHEMBL3463736 | 0.82 | — | — | |
| SCHEMBL29844021 | 0.82 | — | — | |
| SCHEMBL2010171 | 0.82 | — | — | |
| SCHEMBL3463739 | 0.82 | — | — | |
| SCHEMBL25075 | 0.82 | — | — | |
| SCHEMBL25073 | 0.82 | — | — | |
| SCHEMBL7699345 | 0.82 | — | — | |
| SCHEMBL28084436 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8928972-B2 | Reflective optical element for EUV lithography | CARL ZEISS SMT GMBH (DE) | 2015-01-06 | — | — | US | claimed |
| US-20120013976-A1 | REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY | CARL ZEISS SMT GMBH (DE) | 2012-01-19 | — | — | US | claimed |
| US-8928972-B2 | Reflective optical element for EUV lithography | CARL ZEISS SMT GMBH (DE) | 2015-01-06 | — | — | US | disclosed |
| US-8928972-B2 | Reflective optical element for EUV lithography | CARL ZEISS SMT GMBH (DE) | 2015-01-06 | — | — | US | disclosed |
| US-20120013976-A1 | REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY | CARL ZEISS SMT GMBH (DE) | 2012-01-19 | — | — | US | disclosed |
| US-20120013976-A1 | REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY | CARL ZEISS SMT GMBH (DE) | 2012-01-19 | — | — | US | disclosed |