Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.49 |
| ▸ | ELANE | P08246 | 7/20 | 0.35 |
| ▸ | PDK1 | Q15118 | 3/20 | 0.35 |
| ▸ | PDK2 | Q15119 | 3/20 | 0.35 |
| ▸ | PDK3 | Q15120 | 3/20 | 0.35 |
| ▸ | PDK4 | Q16654 | 3/20 | 0.35 |
| ▸ | ABCC9 | O60706 | 3/20 | 0.35 |
| ▸ | ABCC8 | Q09428 | 3/20 | 0.35 |
| ▸ | KCNJ11 | Q14654 | 3/20 | 0.35 |
| ▸ | KCNJ8 | Q15842 | 3/20 | 0.35 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10390140 | 0.96 | ALDH1A1 (0.46) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL2831447 | 0.95 | TSHR (0.44) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL2831676 | 0.95 | TSHR (0.44) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL2900801 | 0.86 | ALDH1A1 (0.37) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL10388638 | 0.82 | CYP1A2 (0.32) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL2404185 | 0.75 | ALDH1A1 (0.45) | ALDH1A1TSHRTDP1MEN1KMT2A | |
| SCHEMBL8370734 | 0.74 | ALDH1A1 (0.38) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| Hydrochloric Acid SCHEMBL7192938 | 0.73 | ALDH1A1 (0.43) | ALDH1A1TSHRTDP1MEN1KMT2A | |
| Benzophenone SCHEMBL10622042 | 0.70 | TDP1 (0.89) | ALDH1A1TSHRHSD17B10TDP1ELANE | |
| SCHEMBL1660474 | 0.68 | TDP1 (0.86) | ALDH1A1TSHRHSD17B10TDP1ELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 221 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9733563-B2 | Photosensitive resin composition and photosensitive material comprising the same | LG CHEM, LTD. (KR) | 2017-08-15 | — | — | US | claimed |
| WO-2009021256-A1 | METHOD FOR PRODUCING OPTICAL WAVEGUIDES BASED ON A ORGANOPOLYSILOXANE AND PRINTED CIRCUIT BOARD AND USE | AT & S AUSTRIA TECHNOLOGIE & SYSTEMTECHNIK AKTIENGESELLSCHAFT (AT) | 2009-02-19 | — | — | WO | claimed |
| JP-10195121-A | — | — | None | — | — | JP | disclosed |
| US-20260122792-A1 | CURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND PRINTED WIRING BOARD | TAIYO HOLDINGS CO LTD (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12607932-B2 | Photosensitive composition and film prepared from the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2026-04-21 | — | — | US | disclosed |
| US-12516211-B2 | Ink composition and electronic device including film formed using the ink composition | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-01-06 | — | — | US | disclosed |
| US-20250333579-A1 | COMPOSITION AND PACKAGE STRUCTURE | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2025-10-30 | — | — | US | disclosed |
| US-12441840-B2 | Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same | LG CHEM, LTD. (KR) | 2025-10-14 | — | — | US | disclosed |
| US-20250277085-A1 | RESIN COMPOSITION, DRY FILM, AND CURED PRODUCT | TAIYO HOLDINGS CO., LTD. (JP) | 2025-09-04 | — | — | US | disclosed |
| EP-3678203-B1 | METHOD FOR PREPARING ORGANIC ELECTRONIC DEVICE | LG CHEMICAL LTD (KR) | 2025-06-18 | — | — | EP | disclosed |
| US-20250171664-A1 | DOUBLE-SIDED ADHESIVE AND MULTILAYER STRUCTURE | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2025-05-29 | — | — | US | disclosed |
| US-6143475-A | PATTERNING OF PHOTOSENSITIVE POLYAMIC ACID BY EXPOSURE TO 365 NM WAVELENGTH LIGHT USING I-LINE STEPPER, DEVELOPMENT AND SUBSEQUENT IMIDATION BY HEATING TO FORM POLYIMIDE HAVING LOW THERMAL EXPANSION | HITACHI CHEMICAL CO. (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |
| US-6071667-A | POLYIMIDE PRECURSOR PHOTORESIST; PROTECTIVE COATINGS, PRINTED CIRCUIT DIELECTRICS | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0940724-A2 | Developer for photosensitive polyimide precursor, and method of using it for patterning | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-09-08 | — | — | EP | disclosed |
| US-5932625-A | MONOMER COMPONENT COMPRISING: 30 TO 70 WT. % OF AT LEAST ONE POLYFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE, AND 70 TO 30 WT. % OF AT LEAST ONE MONOFUNCTIONAL UNSATURATED MONOMER HAVING AT LEAST ONE CYCLIC STRUCTURE | DSM N.V. (NL) | 1999-08-03 | — | — | US | disclosed |
| JP-H10195121-A | PRODUCTION OF BLOCK COPOLYMER | SEKISUI CHEM CO LTD | 1998-07-28 | — | — | JP | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0738745-A1 | Polyimide precursor, polyimide and their use | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12607932-B2 | Photosensitive composition and film prepared from the same | SETD2, SETD1B, DDT | ALDH1A1 1387/4885TSHR 4162/4885HSD17B10 4519/4885 |
| US-20260122792-A1 | CURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND PRINTED WIRING BOARD | SMARCB1, SMARCA1, SMARCA5 | ALDH1A1 3010/4885TSHR 2510/4885HSD17B10 2822/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.