Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.60 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35547 | 0.87 | TSHR (0.52) | TSHRTHRBALDH1A1 | |
| SCHEMBL2495497 | 0.82 | TSHR (0.51) | TSHRTHRBALDH1A1 | |
| SCHEMBL17222398 | 0.81 | TSHR (0.64) | TSHRTHRBALDH1A1 | |
| SCHEMBL23493794 | 0.81 | TSHR (0.64) | TSHRTHRBALDH1A1 | |
| SCHEMBL7168756 | 0.81 | TSHR (0.46) | TSHRTHRBALDH1A1 | |
| SCHEMBL49067 | 0.80 | TSHR (0.48) | TSHRTHRBALDH1A1 | |
| SCHEMBL21123180 | 0.79 | TSHR (0.62) | TSHRTHRBALDH1A1 | |
| SCHEMBL10779259 | 0.79 | TSHR (0.52) | TSHRTHRBALDH1A1 | |
| SCHEMBL8850794 | 0.78 | TSHR (0.50) | TSHRTHRBALDH1A1 | |
| SCHEMBL3929660 | 0.78 | TSHR (0.60) | TSHRTHRBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 209 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140340891-A1 | LED COLOR CONVERSION FILTER, METHOD OF MANUFACTURING SAME, AND LED MODULE INCLUDING SAME | SOL COMPONENT CO., LTD. (KR) | 2014-11-20 | — | — | US | claimed |
| EP-2770252-A1 | LED COLOR CONVERSION FILTER, METHOD OF MANUFACTURING SAME, AND LED MODULE INCLUDING SAME | Cho, Shim Hyun (KR) | 2014-08-27 | — | — | EP | claimed |
| US-4526920-A | Contains poly(meth)acrylic ester of oxy or polyoxyalkane polyol, polymerization initiator, filler | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-07-02 | — | — | US | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-12393130-B2 | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-08-19 | — | — | US | disclosed |
| EP-3936576-B1 | BLACK ALUMINUM PIGMENT AND METHOD OF PRODUCING SAME | TOYO ALUMINIUM KK (JP) | 2025-05-28 | — | — | EP | disclosed |
| EP-0785565-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 1997-07-23 | — | — | EP | disclosed |
| EP-0770923-A1 | Photosensitive resin composition and photosensitive resin laminated film containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-05-02 | — | — | EP | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
| EP-0475086-A1 | Photo-sensitive polymer composition | HITACHI, LTD. (JP) | 1992-03-18 | — | — | EP | disclosed |
| EP-0100688-B1 | CURABLE COATING COMPOSITION | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1987-04-22 | — | — | EP | disclosed |
| US-4526920-A | Contains poly(meth)acrylic ester of oxy or polyoxyalkane polyol, polymerization initiator, filler | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-07-02 | — | — | US | disclosed |
| EP-0100688-A2 | Curable coating composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1984-02-15 | — | — | EP | disclosed |
| US-4426243-A | Room-temperature-curable, quick-setting acrylic/epoxy adhesives and methods of bonding | ILLINOIS TOOL WORKS INC. (US) | 1984-01-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | TSHR 3214/4885THRB 3424/4885ALDH1A1 3706/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.