Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2058244 | 0.87 | CA12 (0.40) | ALDH1A1TSHRTDP1 | |
| SCHEMBL2058196 | 0.85 | — | — | |
| SCHEMBL97471 | 0.83 | TSHR (0.37) | TSHRTDP1 | |
| SCHEMBL8764178 | 0.83 | TSHR (0.35) | ALDH1A1TSHRTDP1 | |
| SCHEMBL2058561 | 0.83 | MAPT (0.40) | TSHRTDP1 | |
| SCHEMBL2845420 | 0.83 | TSHR (0.32) | TSHR | |
| SCHEMBL530288 | 0.81 | TRPV1 (0.31) | — | |
| SCHEMBL1641650 | 0.81 | — | — | |
| SCHEMBL346949 | 0.81 | TDP1 (0.40) | TDP1 | |
| SCHEMBL10889627 | 0.81 | MEN1 (0.60) | ALDH1A1LMNATSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260008948-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | RESONAC CORP (JP) | 2026-01-08 | — | — | US | claimed |
| US-20260008949-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | RESONAC CORP (JP) | 2026-01-08 | — | — | US | claimed |
| US-20260002063-A1 | CMP POLISHING LIQUID, CMP POLISHING LIQUID SET, AND POLISHING METHOD | RESONAC CORP (JP) | 2026-01-01 | — | — | US | claimed |
| EP-4657504-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | Resonac Corporation (JP) | 2025-12-03 | — | — | EP | claimed |
| EP-4657503-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | Resonac Corporation (JP) | 2025-12-03 | — | — | EP | claimed |
| EP-4175921-B1 | FREE-FLOWING POWDER COMPRISING A POROUS SUBSTRATE FUNCTIONALIZED WITH AT LEAST ONE ACCELERATOR | SIKA TECH AG (CH) | 2025-09-10 | — | — | EP | claimed |
| US-20250115795-A1 | POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-04-10 | — | — | US | claimed |
| US-20240336810-A1 | POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2024-10-10 | — | — | US | claimed |
| US-20240336809-A1 | POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2024-10-10 | — | — | US | claimed |
| EP-4379776-A1 | POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHING METHOD | Resonac Corporation (JP) | 2024-06-05 | — | — | EP | claimed |
| US-20090292041-A1 | AMINE CONTAINING STRENGTH IMPROVEMENT ADMIXTURE | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) | 2009-11-26 | — | — | US | claimed |
| US-7556684-B2 | Amine containing strength improvement admixture | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) | 2009-07-07 | — | — | US | claimed |
| EP-1725604-B1 | CARBOXYLIC ACID COMPOUNDS COMPRISING ESTER BONDS AND POLYAMIDES PRODUCED THEREFROM | LANXESS DEUTSCHLAND GMBH (DE) | 2009-04-29 | — | — | EP | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| US-20050188896-A1 | Amine containing strength improvement admixture | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH | 2005-09-01 | — | — | US | claimed |
| US-20040198873-A1 | Strength improvement admixture | CONSTRUCTION RESEARCH AND TECHNOLOGY GMBH | 2004-10-07 | — | — | US | claimed |
| EP-1059947-B1 | WATER-ABSORBING, CROSS-LINKED POLYMERIZATES IN THE FORM OF A FOAM, A METHOD FOR THE PRODUCTION THEREOF, AND THEIR USE | BASF AG (DE) | 2004-09-29 | — | — | EP | claimed |
| US-6750262-B1 | USE IN HYGIENE ARTICLES EMPLOYED TO ABSORB BODY FLUIDS AND IN DRESSING MATERIAL FOR COVERING WOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 2004-06-15 | — | — | US | claimed |
| US-6455600-B1 | FOAMING A POLYMERIZABLE AQUEOUS MIXTURE CONSISTS OF UNSATURATED ACIDIC MONOMER OPTIONALLY NEUTRALIZED, CROSSLINKERS, INITIATORS AND SURFACTANT, POLYMERIZING THE MONOMER(S) WHILE NEUTRALIZING ACIDIC GROUP WITH AMINES | BASF AKTIENGESELLSCHAFT (DE) | 2002-09-24 | — | — | US | claimed |
| US-4076618-A | ALKANOLAMINES; ELECTROLESS METAL DEPOSITION BY-PRODUCTS | PHOTOCIRCUITS DIVISION OF KOLLMORGEN CORPORATION (US) | 1978-02-28 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008949-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | F12, EPM2A, SEM1 | ALDH1A1 3865/4885LMNA 43/4885TSHR 4300/4885 |
| US-20260002063-A1 | CMP POLISHING LIQUID, CMP POLISHING LIQUID SET, AND POLISHING METHOD | H1-0, H1-5, H1-2 | ALDH1A1 3856/4885LMNA 50/4885TSHR 3918/4885 |
| US-20260008948-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | EPM2A, AGL, VCL | ALDH1A1 4483/4885LMNA 258/4885TSHR 3957/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.