Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.60 |
| ▸ | KDM3B | Q7LBC6 | 1/20 | 0.47 |
| ▸ | FFAR3 | O14843 | 3/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 3/20 | 0.42 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.40 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.40 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.40 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.40 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.40 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.40 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.40 |
| ▸ | UBE2N | P61088 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | FFAR2 | O15552 | 1/20 | 0.34 |
| ▸ | SLC22A4 | Q9H015 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1691795 | 0.86 | KMT2A (0.55) | KMT2ATDP1KDM3BFFAR3HCAR2 | |
| SCHEMBL10983716 | 0.83 | KMT2A (0.53) | KMT2ATDP1KDM3BFFAR3HCAR2 | |
| SCHEMBL11343851 | 0.81 | KMT2A (0.51) | KMT2ATDP1KDM3BFFAR3HCAR2 | |
| SCHEMBL21345745 | 0.81 | KMT2A (0.54) | KMT2ATDP1KDM3BUBE2NMEN1 | |
| SCHEMBL18640304 | 0.81 | KMT2A (0.50) | KMT2ATDP1KDM3BFFAR3HCAR2 | |
| SCHEMBL153562 | 0.80 | KMT2A (0.50) | KMT2ATDP1KDM3BUBE2NKDM4E | |
| SCHEMBL29007135 | 0.80 | KMT2A (0.54) | KMT2ATDP1KDM3BUBE2NMEN1 | |
| SCHEMBL10735494 | 0.80 | KMT2A (0.50) | KMT2ATDP1KDM3BFFAR3HCAR2 | |
| SCHEMBL3537530 | 0.78 | KMT2A (0.51) | KMT2ATDP1KDM3BUBE2NMEN1 | |
| SCHEMBL8508881 | 0.77 | KMT2A (0.48) | KMT2ATDP1KDM3BFFAR3HCAR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9875904-B2 | Silicon etching liquid, silicon etching method, and microelectromechanical element | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-01-23 | — | — | US | claimed |
| US-20150340241-A1 | SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-26 | — | — | US | claimed |
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| US-20250244669-A1 | COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | EMD PERFORMANCE MATERIALS CORP. | 2025-07-31 | — | — | US | disclosed |
| US-12360453-B2 | PAG-free positive chemically amplified resist composition and methods of using the same | MERCK PATENT GMBH (DE) | 2025-07-15 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| EP-4433873-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| EP-0449726-B1 | Pyrimidine nucleoside derivative and antiviral agent containing the derivative as active ingredient | MITSUBISHI CHEM CORP (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0748316-A1 | PYRIMIDINE ACYCLONUCLEOSIDE DERIVATIVES | SUNKYONG INDUSTRIES CO., LTD. (KR) | 1996-12-18 | — | — | EP | disclosed |
| US-5461060-A | Antiretroviral activity | MITSUBISHI KASEI CORPORATION (JP) | 1995-10-24 | — | — | US | disclosed |
| WO-1995023138-A1 | PYRIMIDINE ACYCLONUCLEOSIDE DERIVATIVES | SUNKYONG INDUSTRIES CO., LTD. (KR) | 1995-08-31 | — | — | WO | disclosed |
| US-5318972-A | Active against retroviruses, human t-cell leukemia/lymphoma viruses | MITSUBISHI KASEI CORPORATION (JP) | 1994-06-07 | — | — | US | disclosed |
| EP-0449726-A1 | Pyrimidine nucleoside derivative and antiviral agent containing the derivative as active ingredient | Mitsubishi Chemical Corporation (JP) | 1991-10-02 | — | — | EP | disclosed |
| EP-0420763-A2 | 6-Substituted acyclopyrimidine nucleoside derivatives and antiviral agent containing the same as active ingredient thereof | Mitsubishi Chemical Corporation (JP) | 1991-04-03 | — | — | EP | disclosed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12619149-B2 | DNQ-free chemically amplified resist composition | POLQ, RECQL, RPA1 | KMT2A 2038/4885TDP1 413/4885KDM3B 2934/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.