SCHEMBL10735494

SCHEMBL10735494

CCCCCCc1c[nH]c(=S)[nH]c1=O

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.50
TDP1 Q9NUW8 1/20 0.50
HCAR2 Q8TDS4 3/20 0.43
FFAR3 O14843 1/20 0.43
FFAR2 O15552 1/20 0.43
TYMP P19971 3/20 0.41
ALDH1A1 P00352 2/20 0.40
GPR84 Q9NQS5 7/20 0.39
KDM3B Q7LBC6 1/20 0.39
KDM4E B2RXH2 1/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ACHE P22303 1/20 0.38
BACE1 P56817 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11343851 0.98 KMT2A (0.51) KMT2ATDP1HCAR2FFAR3FFAR2
SCHEMBL10983716 0.93 KMT2A (0.53) KMT2ATDP1HCAR2FFAR3FFAR2
SCHEMBL1691795 0.86 KMT2A (0.55) KMT2ATDP1HCAR2FFAR3FFAR2
SCHEMBL6573665 0.83 TYMP (0.51) HCAR2TYMPGPR84
SCHEMBL11583204 0.81 KMT2A (0.49) KMT2ATDP1HCAR2FFAR3FFAR2
SCHEMBL357910 0.81 TYMP (0.50) HCAR2TYMP
SCHEMBL11456064 0.78 DAO (0.44) KMT2ATDP1HCAR2ALDH1A1GPR84
SCHEMBL3537530 0.75 KMT2A (0.51) KMT2ATDP1ALDH1A1KDM3BKDM4E
SCHEMBL356483 0.75 TYMP (0.49) HCAR2FFAR3TYMPKDM4E
SCHEMBL10979560 0.74 DAO (0.44) KMT2ATDP1HCAR2ALDH1A1KDM3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9875904-B2 Silicon etching liquid, silicon etching method, and microelectromechanical element MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-01-23 US claimed
US-20150340241-A1 SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-11-26 US claimed
US-8841062-B2 Positive working photosensitive material AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-09-23 US claimed
US-20140154624-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-06-05 US claimed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US claimed
US-12619149-B2 DNQ-free chemically amplified resist composition MERCK PATENT GMBH (DE) 2026-05-05 US disclosed
US-12393115-B2 Positive working photosensitive material MERCK PATENT GMBH (DE) 2025-08-19 US disclosed
US-20250244669-A1 COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH EMD PERFORMANCE MATERIALS CORP. 2025-07-31 US disclosed
US-12360453-B2 PAG-free positive chemically amplified resist composition and methods of using the same MERCK PATENT GMBH (DE) 2025-07-15 US disclosed
CN-114651212-B Positive photosensitive material 默克专利股份有限公司 2025-05-02 CN disclosed
EP-4433873-A2 COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH Merck Patent GmbH (DE) 2024-09-25 EP disclosed
CN-112654928-B Positive photosensitive material 默克专利股份有限公司 2024-09-24 CN disclosed
US-4305945-A Isoureas and isothioureas SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1981-12-15 US disclosed
EP-0003677-B1 PYRIMIDONES, PROCESSES FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1981-11-11 EP disclosed
US-4234588-A ANTIHISTAMINES SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1980-11-18 US disclosed
EP-0013071-A1 Pyrimidinone derivatives, processes for preparing them and pharmaceutical compositions containing them SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1980-07-09 EP disclosed
WO-1980000966-A1 NEW HISTAMINE H2-ANTAGONISTS SMITH KLINE FRENCH LAB (GB) 1980-05-15 WO disclosed
EP-0007232-A1 Iso(thio)ureas, processes for their preparation and compositions containing them SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1980-01-23 EP disclosed
EP-0003677-A2 Pyrimidones, processes for their preparation and pharmaceutical compositions containing them SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1979-08-22 EP disclosed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12619149-B2 DNQ-free chemically amplified resist composition POLQ, RECQL, RPA1 KMT2A 2038/4885TDP1 413/4885HCAR2 2291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.