Trimethylammonium

Trimethylammonium

SCHEMBL35526

B.CN(C)C

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3729 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122079717-A Efficient oxygen deleting reagent and application thereof in carbon resource molecular skeleton deoxidizing reconstruction 2026-05-26 CN claimed
US-20260107710-A1 BORON CATALYZED DIELECTRIC FILM DEPOSITIONS APPLIED MATERIALS INC (US) 2026-04-16 US claimed
US-12522917-B2 Method for preparing boron nitride thin film and boron nitride thin film PENTAPRO MATERIALS INC. (TW) 2026-01-13 US claimed
US-12424584-B2 Direct bonding methods and structures ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC. (US) 2025-09-23 US claimed
CN-119874604-A Method for dechlorinating and alkylating geminal dichloro compound 中国科学技术大学先进技术研究院 2025-04-25 CN claimed
CN-114665110-B Preparation method and application of boron-nitrogen modified metal electrocatalyst for improving oxygen reduction durability 大连理工大学 2025-04-01 CN claimed
CN-119465114-A Nickel plating solution on tungsten-based ceramic and chemical plating process thereof 江苏矽智半导体科技有限公司 2025-02-18 CN claimed
US-20250033241-A1 DIRECT MANUFACTURING METHOD FOR CERAMICS COMPONENT WITH COMPLEX STRUCTURE BASED ON LASER 3D PRINTING AND CERAMIC COMPONENT WITH COMPLEX STRUCTURE WUHAN UNIVERSITY OF TECHNOLOGY (CN) 2025-01-30 US claimed
CN-119372625-A Process and apparatus for radical enhanced vapor deposition ASM IP私人控股有限公司 2025-01-28 CN claimed
US-20250029831-A1 PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION ASM IP HOLDING B.V. (NL) 2025-01-23 US claimed
US-4801439-A FORMING BORON NITRIDE CERAMIC PRECURSOR UTILIZING A COMPLEX METAL CATALYST SRI INTERNATIONAL (US) 1989-01-31 US claimed
EP-0300463-A2 A remover solution for photoresist TOKYO OHKA KOGYO CO., LTD. (JP) 1989-01-25 EP claimed
EP-0282561-A1 CATALYTIC PROCESS FOR MAKING COMPOUNDS HAVING A NON-LEWIS ACID/BASE GROUP IIIA METAL TO GROUP VA NONMETAL BOND. STANFORD RES INST INT (US) 1988-09-21 EP claimed
EP-0268975-A2 Process for the preparation of mono, bi and tricyclic amino acids, intermediary compounds and their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1988-06-01 EP claimed
WO-1988002003-A1 CATALYTIC PROCESS FOR MAKING COMPOUNDS HAVING A NON-LEWIS ACID/BASE GROUP IIIA METAL TO GROUP VA NONMETAL BOND SRI INTERNATIONAL (US) 1988-03-24 WO claimed
US-4279951-A Method for the electroless deposition of palladium MINE SAFETY APPLIANCES COMPANY (US) 1981-07-21 US claimed
US-4258127-A PHOTOGRAPHY, FOGGING FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US claimed
US-4255194-A Palladium alloy baths for the electroless deposition MINE SAFETY APPLIANCES COMPANY (US) 1981-03-10 US claimed
US-4243803-A Production of 7-(2-aminomethylphenylacetamido)-3-(1-carboxymethyltetrazol-5-ylthiomethyl)-3-cephem-4-carboxylic acid BRISTOL-MYERS COMPANY (US) 1981-01-06 US claimed
US-4036715-A ELECTRODEPOSITION; LOW CURRENT DENSITY EASTMAN KODAK COMPANY (US) 1977-07-19 US claimed