SCHEMBL355540

SCHEMBL355540

[Al+3].[Al+3].[Ba+2].[Ba+2].[Mn+2].[Mn+2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29440593 0.87
SCHEMBL30320853 0.87
SCHEMBL31143666 0.87
SCHEMBL6686644 0.87
SCHEMBL407706 0.87
SCHEMBL1027248 0.87
Water SCHEMBL83465 0.75
SCHEMBL9561994 0.75
SCHEMBL5806900 0.75
SCHEMBL8510485 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020179886-A1 High luminescence phosphor particles NEOPHOTONICS CORPORATION 2002-12-05 US claimed
WO-2002088019-A2 HIGH LUMINESCENCE PHOSPHOR PARTICLES NEO PHOTONICS CORPORATION (US) 2002-11-07 WO claimed
US-9175174-B2 Dispersions of submicron doped silicon particles NANOGRAM CORPORATION (US) 2015-11-03 US disclosed
US-20140047996-A1 DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES NANOGRAM CORPORATION (US) 2014-02-20 US disclosed
US-8568684-B2 Methods for synthesizing submicron doped silicon particles NANOGRAM CORPORATION (US) 2013-10-29 US disclosed
US-8435477-B2 Dispersions of submicron doped silicon particles NANOGRAM CORPORATION (US) 2013-05-07 US disclosed
US-20120244060-A9 METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES NANOGRAM CORPORATION 2012-09-27 US disclosed
US-20120012032-A1 DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES BI XIANGXIN (US) 2012-01-19 US disclosed
US-20100209328-A1 METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES NANOGRAM CORPORATION 2010-08-19 US disclosed
US-20090075083-A1 Nanoparticle production and corresponding structures NANOGRAM CORPORATION 2009-03-19 US disclosed
US-7384680-B2 Nanoparticle-based power coatings and corresponding structures NANOGRAM CORPORATION (US) 2008-06-10 US disclosed
US-20080026220-A9 NANOPARTICLE-BASED POWER COATINGS AND CORRESPONDING STRUCTURES NANOGRAM DEVICES CORPORATION 2008-01-31 US disclosed
US-7101520-B2 High luminescence phosphor particles and methods for producing the particles NANOGRAM CORPORATION (US) 2006-09-05 US disclosed
US-20060147369-A1 Nanoparticle production and corresponding structures NEOPHOTONICS CORPORATION 2006-07-06 US disclosed
US-20040173780-A1 High luminescence phosphor particles and methods for producing the particles NANOGRAM CORPORATION 2004-09-09 US disclosed
US-20030203205-A1 Nanoparticle production and corresponding structures NEOPHOTONICS CORPORATION 2003-10-30 US disclosed
US-20020179886-A1 High luminescence phosphor particles NEOPHOTONICS CORPORATION 2002-12-05 US disclosed
WO-2002088019-A2 HIGH LUMINESCENCE PHOSPHOR PARTICLES NEO PHOTONICS CORPORATION (US) 2002-11-07 WO disclosed