SCHEMBL3565230

SCHEMBL3565230

CC(C)CCCCCOP(O)O

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
RARB P10826 1/20 0.34
KDM4C Q9H3R0 2/20 0.31
KDM4A O75164 1/20 0.31
PHF8 Q9UPP1 1/20 0.31
KDM2A Q9Y2K7 1/20 0.31
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA9 Q16790 1/20 0.30
TRPV1 Q8NER1 1/20 0.30
TRPA1 O75762 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27557292 1.00 LMNA (0.39) LMNARARBKDM4CKDM4APHF8
SCHEMBL9841655 1.00 LMNA (0.39) LMNARARBKDM4CKDM4APHF8
SCHEMBL9156581 1.00 LMNA (0.39) LMNARARBKDM4CKDM4APHF8
SCHEMBL2043575 1.00 LMNA (0.39) LMNARARBKDM4CKDM4APHF8
Benzene SCHEMBL28716969 0.94 RARB (0.38) LMNARARBKDM4CKDM4APHF8
SCHEMBL1921066 0.91 LMNA (0.36) LMNACA12CA1CA2CA9
Phosphoric Acid SCHEMBL28081025 0.90 SMPD1 (0.34) LMNARARBKDM4C
SCHEMBL29115207 0.87 SPHK1 (0.35) LMNA
SCHEMBL28736439 0.86 LMNA (0.39) LMNARARBKDM4CKDM4APHF8
SCHEMBL1547660 0.86 LMNA (0.39) LMNARARBKDM4CKDM4APHF8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 224 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114106922-A Stainless steel rolling composition 安美科技股份有限公司 2022-03-01 CN claimed
US-10689469-B2 Method of reactive extrusion copolymerization of vinyl monomers EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) 2020-06-23 US claimed
US-20190040174-A1 METHOD OF REACTIVE EXTRUSION COPOLYMERIZATION OF VINYL MONOMERS SHANGHAI FUYUAN RUBBER AND PLASTIC TECHNOLOGY LTD. (CN) 2019-02-07 US claimed
US-7691927-B2 Self-emulsifying liquid stabilizers CHEMTURA EUROPE GMBH (CH) 2010-04-06 US claimed
US-20070254992-A1 Self -Emulsifying Liquid Stabilizers CHEMTURA EUROPE GMBH (CH) 2007-11-01 US claimed
EP-1778776-A1 SELF-EMULSIFYING LIQUID STABILISERS Chemtura Europe GmbH (CH) 2007-05-02 EP claimed
WO-2006018597-A1 SELF-EMULSIFYING LIQUID STABILISERS GREAT LAKES CHEMICAL (EUROPE) GMBH (CH) 2006-02-23 WO claimed
US-20250297065-A1 POLYMER FILM, LAMINATE, AND LAMINATE WITH METAL FUJIFILM CORPORATION (JP) 2025-09-25 US disclosed
CN-116285337-B Polyamide composition, method for producing same, and molded article 旭化成株式会社 2025-05-30 CN disclosed
CN-118480069-A 2-Hydroxy-3- (N-glycidyl-N-alkyl-N-allylammonium) propyl phosphonate and preparation method thereof 江苏海洋大学 2024-08-13 CN disclosed
US-12049541-B2 Polyester resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-07-30 US disclosed
CN-118222188-A Grinding and polishing liquid and preparation method thereof, and graphene-like microstructure functional layer based on exogenous in-situ growth and preparation method thereof 清华大学 2024-06-21 CN disclosed
CN-118206928-A Grinding and polishing liquid and preparation method thereof, and graphene-like microstructure functional layer based on endogenous in-situ synthesis and preparation method thereof 清华大学 2024-06-18 CN disclosed
US-4134868-A Aromatic carboxylic acid ester stabilizers for PVC resins ARGUS CHEMICAL CORPORATION (US) 1979-01-16 US disclosed
US-4110306-A Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl carboxylic acid ester, a triphosphite, and an acid phosphite or salt thereof ARGUS CHEMICAL CORPORATION (US) 1978-08-29 US disclosed
US-4105627-A MERCAPTOHETEROCYCLIC RESIN STABILIZERS ARGUS CHEMICAL CORPORATION (US) 1978-08-08 US disclosed
US-4100132-A RESISTANCE TO METAL-CATALYZED OXIDATIVE DEGRADATION R. T. VANDERBILT COMPANY, INC. (US) 1978-07-11 US disclosed
US-4080364-A Stabilization of polyolefins against degradative deterioration as a result of exposure to light and air at elevated temperatures ARGUS CHEMICAL CORPORATION (US) 1978-03-21 US disclosed
US-4042549-A Improve stabilizers for vinyl halide resins containing a metal halide and an ethoxylated alkylphenol EMERY INDUSTRIES, INC. (US) 1977-08-16 US disclosed
US-3997551-A OXIDATION RESISTANCE, STABILIZE POLYMERS ARGUS CHEMICAL CORPORATION (US) 1976-12-14 US disclosed