⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8719670 | 0.96 | — | — | |
| SCHEMBL18991277 | 0.87 | — | — | |
| SCHEMBL18991387 | 0.85 | — | — | |
| SCHEMBL20199344 | 0.84 | HRH3 (0.31) | — | |
| SCHEMBL18991174 | 0.82 | DNM1 (0.50) | — | |
| SCHEMBL18991601 | 0.82 | DNM1 (0.50) | — | |
| SCHEMBL2546028 | 0.77 | TSHR (0.40) | — | |
| SCHEMBL18991299 | 0.75 | — | — | |
| SCHEMBL18991304 | 0.74 | DNM1 (0.50) | — | |
| SCHEMBL2030909 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 552 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035783-A1 | SIN FILM EMBEDDING METHOD AND FILM FORMATION APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-02-05 | — | — | US | claimed |
| US-20250243398-A1 | IRON CONTROL AS PART OF A WELL TREATMENT USING TIME-RELEASED AGENTS | FLEX-CHEM HOLDING COMPANY, LLC (US) | 2025-07-31 | — | — | US | claimed |
| US-12344933-B2 | SiN film embedding method | TOKYO ELECTRON LIMITED (JP) | 2025-07-01 | — | — | US | claimed |
| US-20250112345-A1 | PROTECTION METHOD AND DEVICE FOR BATTERY COMPONENTS, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRICAL APPARATUS | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) | 2025-04-03 | — | — | US | claimed |
| EP-4518016-A1 | BATTERY COMPONENT PROTECTION METHOD AND DEVICE, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC APPARATUS | Contemporary Amperex Technology (Hong Kong) Limited (HK) | 2025-03-05 | — | — | EP | claimed |
| US-20250054747-A1 | CONFORMAL DEPOSITION OF SILICON NITRIDE | LAM RES CORP (US) | 2025-02-13 | — | — | US | claimed |
| US-12150295-B2 | Method for manufacturing a memory using a plurality of sacrificial pillars | CHANGXIN MEMORY TECHNOLOGIES, INC. (CN) | 2024-11-19 | — | — | US | claimed |
| CN-118402039-A | Conformal deposition of silicon nitride | 朗姆研究公司 | 2024-07-26 | — | — | CN | claimed |
| CN-114725018-B | Memory and preparation method thereof | 长鑫存储技术有限公司 | 2024-06-21 | — | — | CN | claimed |
| EP-4379946-A1 | PROTECTION METHOD AND DEVICE FOR SECONDARY BATTERY, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC DEVICE | Contemporary Amperex Technology Co., Limited (CN) | 2024-06-05 | — | — | EP | claimed |
| US-20120164844-A1 | METHOD AND APPARATUS FOR FORMING OXIDE FILM ON CARBON FILM | TOKYO ELECTRON LIMITED (JP) | 2012-06-28 | — | — | US | claimed |
| US-20120164842-A1 | TRENCH EMBEDDING METHOD AND FILM-FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2012-06-28 | — | — | US | claimed |
| US-20120103518-A1 | FILM FORMATION APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2012-05-03 | — | — | US | claimed |
| US-8168375-B2 | Patterning method | TOKYO ELECTRON LIMITED (JP) | 2012-05-01 | — | — | US | claimed |
| US-20120028437-A1 | TRENCH-FILLING METHOD AND FILM-FORMING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2012-02-02 | — | — | US | claimed |
| US-20110237082-A1 | MICRO PATTERN FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2011-09-29 | — | — | US | claimed |
| US-20110195580-A1 | METHOD FOR FORMING LAMINATED STRUCTURE INCLUDING AMORPHOUS CARBON FILM | TOKYO ELECTRON LIMITED (JP) | 2011-08-11 | — | — | US | claimed |
| US-7989354-B2 | Patterning method | TOKYO ELECTRON LIMITED (JP) | 2011-08-02 | — | — | US | claimed |
| US-20100130015-A1 | PATTERNING METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-05-27 | — | — | US | claimed |
| US-20100112496-A1 | PATTERNING METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-05-06 | — | — | US | claimed |