SCHEMBL3577575

SCHEMBL3577575

[O-][S+](Cl)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6630504 0.82
SCHEMBL642268 0.75
SCHEMBL302 0.72
SCHEMBL72657 0.72
SCHEMBL11274560 0.67
SCHEMBL7126192 0.67
Methane SCHEMBL1818230 0.67
Charcoal, Activated SCHEMBL2479918 0.67
Phosphine SCHEMBL10394278 0.67
Ammonia Solution, Strong SCHEMBL15540045 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5378653-A Method of forming aluminum based pattern SONY CORPORATION (JP) 1995-01-03 US claimed
US-12398460-B2 Substrate processing apparatus, furnace opening assembly, substrate processing method, method of manufacturing semiconductor device and non-transitory tangible medium Kokusai Electric Corporation (JP) 2025-08-26 US disclosed
CN-116536643-A Vapor deposition process and deposition assembly ASM IP私人控股有限公司 2023-08-04 CN disclosed
CN-115116890-A Substrate processing apparatus, furnace mouth assembly, substrate processing method, method for manufacturing semiconductor device, and recording medium 株式会社国际电气 2022-09-27 CN disclosed
US-20220298627-A1 SUBSTRATE PROCESSING APPARATUS, FURNACE OPENING ASSEMBLY, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY TANGIBLE MEDIUM Kokusai Electric Corporation (JP) 2022-09-22 US disclosed
US-20150316847-A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2015-11-05 US disclosed
US-20130022914-A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST IDEMITSU KOSAN CO., LTD. (JP) 2013-01-24 US disclosed
US-20100035891-A1 Pharmaceutically Active Compounds PFIZER INC 2010-02-11 US disclosed
US-7326700-B2 Cyclohexenyl phenyl carboxamides tocolytic oxytocin receptor antagonists WYETH (US) 2008-02-05 US disclosed
US-7202239-B2 Cyclohexylphenyl carboxamides tocolytic oxytocin receptor antagonists WYETH (US) 2007-04-10 US disclosed
US-5445712-A Using a combination of a high-order fluorocarbon compound and an oxyhalogen compound; high selectivity; high etch rate; little damage; low pollution SONY CORPORATION (JP) 1995-08-29 US disclosed
US-5378653-A Method of forming aluminum based pattern SONY CORPORATION (JP) 1995-01-03 US disclosed
US-5376234-A Dry etching method SONY CORPORATION (JP) 1994-12-27 US disclosed
EP-0270304-B1 ESTER MANUFACTURE Interox Chemicals Limited (GB) 1991-07-24 EP disclosed
US-4867916-A Ester manufacture INTEROX CHEMICALS LIMITED (GB) 1989-09-19 US disclosed
EP-0270304-A1 Ester manufacture Interox Chemicals Limited (GB) 1988-06-08 EP disclosed
US-4593098-A Piperazinone and piperazine polypeptides THE UPJOHN COMPANY (US) 1986-06-03 US disclosed
US-4534897-A Piperazinone, piperazine, 1,4-diazepin-2-one and 1,4-diazepine intermediate compounds THE UPJOHN COMPANY (US) 1985-08-13 US disclosed
US-4251438-A ANALGESICS, PSYCHOTHERAPEUTIC AGENTS THE UPJOHN COMPANY (US) 1981-02-17 US disclosed
US-4209512-A INSECTICIDES, MITICIDES SANKYO COMPANY LIMITED (JP) 1980-06-24 US disclosed