SCHEMBL3590582

SCHEMBL3590582

CSc1nnc([S])s1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5181029 0.80
SCHEMBL12313926 0.72 FBP1 (0.48)
SCHEMBL1594941 0.70
SCHEMBL3729632 0.70
SCHEMBL1030635 0.68
SCHEMBL750885 0.68
SCHEMBL8361155 0.68
SCHEMBL8363822 0.68
SCHEMBL12665876 0.67 CA1 (0.38)
SCHEMBL13819917 0.67 KMT2A (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7754743-B2 Heteroarylcarbamoylbenzene derivatives BANYU PHARMACEUTICAL CO., LTD. (JP) 2010-07-13 US disclosed
US-20090018056-A1 Heteroarylcarbamoylbenzene derivatives MSD K.K. (JP) 2009-01-15 US disclosed
US-7432287-B2 Heteroarylcarbamoylbenzene derivative BANYU PHARMECEUTICAL CO., LTD. (JP) 2008-10-07 US disclosed
US-7314699-B2 Radiation-sensitive mixture and recording material produced therewith AGFA GRAPHICS NV (BE) 2008-01-01 US disclosed
US-20060167053-A1 Heteroarylcarbamoylbenzene derivative MSD K.K. (JP) 2006-07-27 US disclosed
EP-1600442-A1 HETEROARYLCARBAMOYLBENZENE DERIVATIVE BANYU PHARMACEUTICAL CO., LTD. (JP) 2005-11-30 EP disclosed
EP-1359008-B1 Radiation-sensitive mixture, recording material using this mixture, and method for preparing a printing plate AGFA GEVAERT (BE) 2005-08-31 EP disclosed
US-20030215744-A1 Radiation-sensitive mixture and recording material produced therewith AGFA-GEVAERT (BE) 2003-11-20 US disclosed
EP-1359008-A1 Radiation-sensitive mixture and recording material using this mixture Agfa-Gevaert (BE) 2003-11-05 EP disclosed
US-6395766-B1 COGNITION ACTIVATORS MERCK SHARP & DOHME LIMITED (GB) 2002-05-28 US disclosed
US-4826992-A MICROBIOCIDE INTERMEDIATES ELI LILLY AND COMPANY (US) 1989-05-02 US disclosed
EP-0313083-A2 Silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-04-26 EP disclosed
EP-0307927-A2 Silver halide color photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1989-03-22 EP disclosed
US-4795815-A BACTERICIDES, MICROBIOCIDES ELI LILLY AND COMPANY (US) 1989-01-03 US disclosed
EP-0295632-A2 Silver halide color photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1988-12-21 EP disclosed
US-4716232-A 1-(vinyl phosphonate adduct) pyrazolidinones ELI LILLY AND COMPANY (US) 1987-12-29 US disclosed
EP-0203723-A1 2,3-(dihydro)bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-12-03 EP disclosed
EP-0203722-A1 Bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-12-03 EP disclosed
EP-0202794-A1 7-Substituted-2,3-(Dihydro) bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-11-26 EP disclosed
EP-0202046-A1 7-Substituted bicyclic pyrazolidinones ELI LILLY AND COMPANY (US) 1986-11-20 EP disclosed