⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL379201 | 0.96 | — | — | |
| SCHEMBL14915801 | 0.93 | — | — | |
| SCHEMBL10687258 | 0.71 | — | — | |
| SCHEMBL9912286 | 0.69 | — | — | |
| SCHEMBL708170 | 0.69 | — | — | |
| SCHEMBL3078982 | 0.69 | LMNA (0.40) | — | |
| SCHEMBL1247492 | 0.69 | EGLN1 (0.50) | — | |
| SCHEMBL2959030 | 0.69 | — | — | |
| SCHEMBL15360267 | 0.67 | — | — | |
| SCHEMBL11480139 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9359223-B2 | Method for producing thin film electrodes | UCHICAGO ARGONNE, LLC (US) | 2016-06-07 | — | — | US | claimed |
| US-20130071670-A1 | METHOD FOR PRODUCING THIN FILM ELECTRODES | UCHICAGO ARGONNE, LLC (US) | 2013-03-21 | — | — | US | claimed |
| CN-118949976-B | Porous IrRu oxide catalyst, preparation method and catalytic application | 天津大学 | 2025-01-28 | — | — | CN | disclosed |
| US-20210143442-A1 | CATALYST FOR FUEL CELL AND MANUFACTURING METHOD THEREOF | HYUNDAI MOBIS CO., LTD. (KR) | 2021-05-13 | — | — | US | disclosed |
| CN-112786902-A | Catalyst for fuel cell and method for producing the same | 现代摩比斯株式会社 | 2021-05-11 | — | — | CN | disclosed |
| CN-107431013-A | Etching mask, etching mask precursor, the manufacture method of the manufacture method of oxide skin(coating) and thin film transistor (TFT) | 国立大学法人北陆先端科学技术大学院大学 | 2017-12-01 | — | — | CN | disclosed |
| US-9178022-B2 | Precursor composition and method for forming amorphous conductive oxide film | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20130112973-A1 | PRECURSOR COMPOSITION AND METHOD FOR FORMING AMORPHOUS CONDUCTIVE OXIDE FILM | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20100113260-A1 | Ruthenium compositions and methods of making the same | SYMYX TECHNOLOGIES, INC. (US) | 2010-05-06 | — | — | US | disclosed |
| US-20090286678-A1 | High Surface Area Metal And Metal Oxide Materials and Methods of Making the Same | SYMYX TECHNOLOGIES, INC. (US) | 2009-11-19 | — | — | US | disclosed |
| US-20090270251-A1 | Cobalt compositions and methods of making the same | SYMYX TECHNOLOGIES, INC. (US) | 2009-10-29 | — | — | US | disclosed |
| US-20090215613-A1 | Yttrium Compositions And Methods of Making the Same | SYMYX TECHNOLOGIES, INC. (US) | 2009-08-27 | — | — | US | disclosed |
| US-20090187036-A1 | Nickel Compositions And Methods of Making the Same | SYMYX TECHNOLOGIES, INC. (US) | 2009-07-23 | — | — | US | disclosed |
| US-20090182160-A1 | Vanadium Compositions And Methods of Making the Same | SYMYX TECHNOLOGIES, INC. (US) | 2009-07-16 | — | — | US | disclosed |
| US-20090029852-A1 | Molybdenum Compositions And Methods of Making the Same | FREESLATE, INC. | 2009-01-29 | — | — | US | disclosed |
| US-20090011930-A1 | Cerium Compositions and Methods of Making the Same | SYMYX TECHNOLOGIES, INC. (US) | 2009-01-08 | — | — | US | disclosed |
| EP-1879833-A2 | HIGH SURFACE AREA METAL AND METAL OXIDE MATERIALS AND METHODS OF MAKING SAME | Symyx Technologies, Inc. (US) | 2008-01-23 | — | — | EP | disclosed |
| WO-2006119311-A2 | HIGH SURFACE AREA METAL AND METAL OXIDE MATERIALS AND METHODS OF MAKING SAME | SYMYX TECHNOLOGIES, INC. (US) | 2006-11-09 | — | — | WO | disclosed |