SCHEMBL35974

SCHEMBL35974

COC(=O)C(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2664131 1.00
SCHEMBL7580898 1.00 SMN1; SMN2 (0.48)
SCHEMBL16377936 1.00
SCHEMBL29048961 0.81 SMN1; SMN2 (0.36)
SCHEMBL4633092 0.81 SMN1; SMN2 (0.48)
SCHEMBL1928703 0.81 SMN1; SMN2 (0.36)
SCHEMBL7249667 0.81 SMN1; SMN2 (0.36)
SCHEMBL2152131 0.80 SMN1; SMN2 (0.42)
SCHEMBL30090510 0.80 SMN1; SMN2 (0.34)
SCHEMBL15304440 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 10902 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260140450-A1 LIQUID CHEMICAL AND METHOD FOR PRODUCING LIQUID CHEMICAL FUJIFILM CORPORATION (JP) 2026-05-21 US claimed
EP-3870960-B1 CHEMICAL LIQUID MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2026-04-15 EP claimed
EP-3883663-B9 CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2026-02-25 EP claimed
US-12559301-B2 Member, container, chemical liquid storage body, reactor, distillation column, filter unit, storage tank, pipe line, and chemical liquid manufacturing method FUJIFILM CORPORATION (JP) 2026-02-24 US claimed
US-12554201-B2 Liquid chemical and method for producing liquid chemical FUJIFILM CORPORATION (JP) 2026-02-17 US claimed
US-20260014494-A1 IMPURITY ACQUISITION METHOD AND IMPURITY ACQUISITION APPARATUS FOR ACQUIRING METAL IMPURITIES IN ORGANIC SOLVENTS ORGANO CORPORATION (JP) 2026-01-15 US claimed
US-20260008931-A1 ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME HUNETPLUS CO LTD (KR) 2026-01-08 US claimed
US-12454405-B2 Chemical liquid and chemical liquid storage body FUJIFILM CORPORATION (JP) 2025-10-28 US claimed
EP-3883663-B1 CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2025-10-01 EP claimed
WO-2025111296-A1 ELECTROLYTE COMPOSITIONS AND ELECTROCHEMICAL DEVICES USING THE SAME II-VI DELAWARE, INC. (US) 2025-05-30 WO claimed
CN-1229522-A Detergent for lithography CLARIANT INT LTD (CH) 1999-09-22 CN claimed
US-5939139-A Method of removing coated film from substrate edge surface and apparatus for removing coated film TOKYO ELECTRON LIMITED (JP) 1999-08-17 US claimed
EP-0923112-A1 DETERGENT FOR LITHOGRAPHY Clariant International Ltd. (CH) 1999-06-16 EP claimed
EP-0896014-A1 SOLUBLE POLYIMIDE RESIN, PROCESS FOR PREPARING THE SAME, AND POLYIMIDE RESIN SOLUTION COMPOSITION MARUZEN PETROCHEMICAL CO., LTD. (JP) 1999-02-10 EP claimed
EP-0832082-A1 N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS ZENECA LIMITED (GB) 1998-04-01 EP claimed
WO-1996040681-A1 N-HETEROARYL-PYRIDINESULFONAMIDE DERIVATIVES AND THEIR USE AS ENDOTHELIN ANTAGONISTS ZENECA LIMITED (GB) 1996-12-19 WO claimed
US-5456853-A Ether esters and carbonates; nontoxic; evironmentally safe RUST-OLEUM CORPORATION (US) 1995-10-10 US claimed
US-5164279-A Quinonediazide SHIPLEY COMPANY INC. (US) 1992-11-17 US claimed
US-5068399-A PROCESS FOR PREPARING UNSATURATED CARBOXYLIC ACID ESTER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-11-26 US claimed
EP-0429800-A2 Process for preparing unsaturated carboxylic acid ester MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1991-06-05 EP claimed