SCHEMBL35979

SCHEMBL35979

F[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL497495 0.87
Ammonia Solution, Strong SCHEMBL5697677 0.87
SCHEMBL31634299 0.87
SCHEMBL21353820 0.87
SCHEMBL21174925 0.87
SCHEMBL4930769 0.87
Water SCHEMBL3273561 0.87
SCHEMBL31622460 0.87
SCHEMBL20768012 0.87
SCHEMBL8023481 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 21306 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260147287-A1 TWO-COMPONENT DEVELOPER CANON KABUSHIKI KAISHA (JP) 2026-05-28 US claimed
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
CN-224287457-U No substrate peep-proof film Shenzhen Prinkay Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-121913595-B Discrete carbon-based biological substrate for targeted treatment of high-concentration organic wastewater and preparation process thereof Hunan Zhongfu Environmental Protection Technology Research Institute Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-117863557-B Photo-curing 3D printing release device and method JI HUA LABORATORY (CN) 2026-05-26 CN claimed
US-12642023-B2 Plasma etching processes TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-26 US claimed
CN-122094810-A Article with variable line geometry and method of making same 2026-05-26 CN claimed
US-12638615-B2 Coated articles demonstrating anti-reflection, contaminant build-up resistance and UV durability PPG INDUSTRIES OHIO, INC. (US) 2026-05-26 US claimed
CN-122085625-A Two-component developer 2026-05-26 CN claimed
CN-122076250-A Composite breathable film, preparation method thereof and bubble cap drying agent 2026-05-26 CN claimed
EP-0053499-A1 Process for producing crystalline aluminosilicates MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1982-06-09 EP claimed
EP-0051449-A1 Method of manufacturing amorphous silicon films KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-05-12 EP claimed
EP-0031255-A2 Crystalline aluminosilicates, their production and use MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1981-07-01 EP claimed
US-4259278-A Method of reshaping warped graphite enclosures and the like ULTRA CARBON CORPORATION (US) 1981-03-31 US claimed
US-4221832-A COATING WITH METAL CENTRE DE RECHERCHES METALLURGIQUES-CENTRUM VOOR RESEARCH IN DE METALLURGIE (BE) 1980-09-09 US claimed
US-4138509-A Silicon purification process MOTOROLA, INC. (US) 1979-02-06 US claimed
US-4102985-A Arc heater production of silicon involving a hydrogen reduction WESTINGHOUSE ELECTRIC CORP. (US) 1978-07-25 US claimed
US-4070444-A Low cost, high volume silicon purification process MOTOROLA INC. (US) 1978-01-24 US claimed
US-3983012-A Epitaxial growth of silicon or germanium by electrodeposition from molten salts THE BOARD OF TRUSTEES OF LELAND STANFORD JUNIOR UNIVERSITY (US) 1976-09-28 US claimed
US-3976759-A Process for removal of fluoride compounds from spent alkylation catalyst TEXACO INC. (US) 1976-08-24 US claimed