⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1002584 | 1.00 | — | — | |
| SCHEMBL2855156 | 0.87 | — | — | |
| SCHEMBL94504 | 0.87 | — | — | |
| SCHEMBL9272847 | 0.87 | — | — | |
| SCHEMBL566932 | 0.87 | — | — | |
| SCHEMBL9059361 | 0.87 | — | — | |
| SCHEMBL16028457 | 0.87 | — | — | |
| SCHEMBL15412001 | 0.87 | — | — | |
| SCHEMBL9060380 | 0.87 | — | — | |
| SCHEMBL10379776 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9425 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240234581-A1 | DISPLAY DEVICE AND ELECTRONIC DEVICE | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2024-07-11 | — | — | US | claimed |
| US-20240147761-A1 | METHOD FOR MANUFACTURING DISPLAY APPARATUS | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2024-05-02 | — | — | US | claimed |
| US-11935962-B2 | Semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2024-03-19 | — | — | US | claimed |
| WO-2024040958-A1 | LED CHIP BASED ON ALUMINUM OXIDE-SILICON OXIDE COMPOSITE SUBSTRATE AND MANUFACTURING METHOD THEREFOR | 聚灿光电科技股份有限公司 | 2024-02-29 | — | — | WO | claimed |
| CN-109633197-B | Double-heating-electrode wide-range wind speed sensor and manufacturing method thereof | 哈尔滨理工大学 | 2024-01-26 | — | — | CN | claimed |
| US-20240006418-A1 | TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2024-01-04 | — | — | US | claimed |
| US-20230422529-A1 | MULTI-LEVEL DEVICE AND METHOD OF MANUFACTURING THE SAME | POSTECH Research and Business Development Foundation (KR) | 2023-12-28 | — | — | US | claimed |
| US-20230309346-A1 | IMAGING DEVICE, DISPLAY APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY APPARATUS | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2023-09-28 | — | — | US | claimed |
| US-11764309-B2 | Semiconductor device and display device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2023-09-19 | — | — | US | claimed |
| CN-116762476-A | Method for manufacturing display device | 株式会社半导体能源研究所 | 2023-09-15 | — | — | CN | claimed |
| US-6554906-B1 | Wafer holder for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus using the same | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2003-04-29 | — | — | US | claimed |
| US-20020110940-A1 | Process for producing a light emitting device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. | 2002-08-15 | — | — | US | claimed |
| US-20010023091-A1 | Method for producing semiconductor device | YAMAGUCHI NAOAKI (JP) | 2001-09-20 | — | — | US | claimed |
| EP-1119026-A2 | Wafer holder for semiconductor manufacturing apparatus | Sumitomo Electric Industries, Ltd. (JP) | 2001-07-25 | — | — | EP | claimed |
| US-6174757-B1 | Method for producing semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2001-01-16 | — | — | US | claimed |
| US-5897346-A | Method for producing a thin film transistor | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1999-04-27 | — | — | US | claimed |
| EP-0406580-B1 | A composite material and a method for producing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1996-09-04 | — | — | EP | claimed |
| US-5352522-A | Composite material comprising metallic alloy grains coated with a dielectric substance | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-10-04 | — | — | US | claimed |
| EP-0406580-A1 | A composite material and a method for producing the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1991-01-09 | — | — | EP | claimed |
| US-4837123-A | Mask structure for lithography, method of preparation thereof and lithographic method | CANON KABUSHIKI KAISHA (JP) | 1989-06-06 | — | — | US | claimed |