SCHEMBL566932

SCHEMBL566932

[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[N-3].[N-3].[N-3].[N-3].[N-3].[N-3].[N-3].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4].[Ti+4].[Ti+4].[Ti+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16314 0.87
SCHEMBL29378154 0.87
SCHEMBL137606 0.87
SCHEMBL36012 0.87
SCHEMBL149633 0.87
SCHEMBL4309424 0.87
SCHEMBL1002584 0.87
SCHEMBL30105871 0.87
SCHEMBL14691700 0.75
SCHEMBL9060380 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8236685-B2 Phase change memory device having multiple metal silicide layers and method of manufacturing the same HYNIX SEMICONDUCTOR INC. (KR) 2012-08-07 US claimed
US-7750383-B2 Semiconductor apparatus and method for manufacturing the semiconductor apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2010-07-06 US claimed
US-7704787-B2 Methods for fabricating phase changeable memory devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-04-27 US claimed
US-20100065804-A1 PHASE CHANGE MEMORY DEVICE HAVING MULTIPLE METAL SILICIDE LAYERS AND METHOD OF MANUFACTURING THE SAME HYNIX SEMICONDUCTOR INC. (KR) 2010-03-18 US claimed
US-7402851-B2 Phase changeable memory devices including nitrogen and/or silicon and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-07-22 US claimed
US-7397092-B2 Phase changable memory device structures SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-07-08 US claimed
US-20080073750-A1 Semiconductor Storage Apparatus and Method for Manufacturing the Same KABUSHIKI KAISHA TOSHIBA (JP) 2008-03-27 US claimed
US-20080073681-A1 SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR APPARATUS KABUSHIKI KAISHA TOSHIBA (JP) 2008-03-27 US claimed
US-20060281217-A1 Methods For Fabricating Phase Changeable Memory Devices SAMSUNG ELECTRONICS CO., LTD. 2006-12-14 US claimed
US-7115927-B2 Phase changeable memory devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-10-03 US claimed
US-20060148125-A1 Phase changable memory device structures HORII HIDEKI 2006-07-06 US claimed
US-7037749-B2 Methods for forming phase changeable memory devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-05-02 US claimed
US-20050002227-A1 Phase changeable memory devices including nitrogen and/or silicon and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-01-06 US claimed
US-20040251551-A1 Phase changeable memory devices including carbon nano tubes and methods for forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-12-16 US claimed
US-20040183107-A1 Phase changable memory device structures and related methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-09-23 US claimed
US-20040165422-A1 Phase changeable memory devices and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-08-26 US claimed
US-20230301117-A1 MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME MACRONIX INTERNATIONAL CO., LTD. (TW) 2023-09-21 US disclosed
WO-2021231819-A1 MICROELECTROMECHANICAL DEVICE WITH BEAM STRUCTURE OVER SILICON NITRIDE UNDERCUT TEXAS INSTRUMENTS INCORPORATED (US) 2021-11-18 WO disclosed
US-20040183107-A1 Phase changable memory device structures and related methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-09-23 US disclosed
US-20040165422-A1 Phase changeable memory devices and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-08-26 US disclosed