⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27728304 | 1.00 | — | — | |
| SCHEMBL6311816 | 0.89 | — | — | |
| SCHEMBL6319137 | 0.89 | — | — | |
| SCHEMBL18092242 | 0.89 | — | — | |
| SCHEMBL6841995 | 0.89 | — | — | |
| SCHEMBL9134816 | 0.89 | — | — | |
| Helium SCHEMBL7645253 | 0.89 | — | — | |
| SCHEMBL22287293 | 0.89 | — | — | |
| Fluoride SCHEMBL6307522 | 0.89 | — | — | |
| SCHEMBL31658936 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 39164 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260145118-A1 | PROCESS FOR TREATING FLUORINATED GASES | NUMAT TECHNOLOGIES, INC. (US) | 2026-05-28 | — | — | US | claimed |
| US-20260150635-A1 | INHIBITED ATOMIC LAYER DEPOSITION FOR PATTERNING APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2026-05-28 | — | — | US | claimed |
| EP-4747262-A1 | SILICON PRECURSOR COMPOUND, METHOD FOR PREPARING THE SAME, AND METHOD FOR PREPARING A SILICON-CONTAINING THIN FILM | Merck Patent GmbH (DE) | 2026-05-27 | — | — | EP | claimed |
| EP-4747333-A1 | COMPOSITIONS COMPRISING 1,1,1,4,4,4-HEXAFLUORO-2-BUTYNE | The Chemours Company FC, LLC (US) | 2026-05-27 | — | — | EP | claimed |
| US-12637761-B2 | Method of densifying plasma-resistant coating layer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-26 | — | — | US | claimed |
| CN-117684147-B | Silicon carbide/boron doped diamond semiconductor composite coating material and preparation method and application thereof | Hunan Xinfeng Technology Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-121843442-B | Method for etching silicon nitride by using ultra-low power dry method | Hefei Silicon Valley Microelectronics Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12642026-B2 | Nitrogen-containing aromatic or ring structure molecules for plasma etch and deposition | AMERICAN AIR LIQUIDE, INC. (US) | 2026-05-26 | — | — | US | claimed |
| US-12637648-B2 | Method for manufacturing nanostructure and nanostructure | Institute of Microelectronics, Chinese Academy of Sciences (CN) | 2026-05-26 | — | — | US | claimed |
| CN-122081898-A | Heavy hydrogen containing membranes | — | 2026-05-26 | — | — | CN | claimed |
| EP-0004767-A1 | Removal of dinitrogen difluoride from atmospheres containing nitrogen trifluoride | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1979-10-17 | — | — | EP | claimed |
| US-4165773-A | FROM FLUORINE ATOMS AND AZIDE RADICALS | ROCKWELL INTERNATIONAL CORPORATION (US) | 1979-08-28 | — | — | US | claimed |
| US-4156598-A | ADSORPTION OF NITROUS OXIDE ON A ZEOLITE AFTER PARTIAL REMOVAL OF DINITROGEN DIFULORIDE | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1979-05-29 | — | — | US | claimed |
| US-4102988-A | HYDROGEN OR DEUTERIUM FLUORIDE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1978-07-25 | — | — | US | claimed |
| US-4091081-A | FROM FLUORINE AND LIQUID AMMONIUM ACID FLUORIDE | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1978-05-23 | — | — | US | claimed |
| US-4070439-A | Process for the recovery of antimony pentachloride from a spent antimony catalyst mixture | DAIKIN KOGYO CO., LTD. (JA) | 1978-01-24 | — | — | US | claimed |
| US-4039971-A | FAST DISCHARGE, HIGH POWER, ELECTRIC DISCHARGE PUMPED GAS LASER | THE AEROSPACE CORPORATION (US) | 1977-08-02 | — | — | US | claimed |
| US-4031484-A | Portable chemical laser with gas recirculation | UNITED TECHNOLOGIES CORPORATION (US) | 1977-06-21 | — | — | US | claimed |
| US-4001380-A | MANUFACTURE OF NITROGEN TRIFLUORIDE | ALLIED CHEMICAL CORPORATION (US) | 1977-01-04 | — | — | US | claimed |
| US-3961024-A | Fluoro compound production | ALLIED CHEMICAL CORPORATION (US) | 1976-06-01 | — | — | US | claimed |