⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL4544067 | 1.00 | — | — | |
| Fluoride SCHEMBL4706001 | 1.00 | — | — | |
| Fluoride SCHEMBL5947020 | 1.00 | — | — | |
| Fluoride SCHEMBL1306081 | 1.00 | — | — | |
| Fluoride SCHEMBL3226162 | 1.00 | — | — | |
| Fluoride SCHEMBL4704684 | 1.00 | — | — | |
| Fluoride SCHEMBL41858 | 1.00 | — | — | |
| Fluoride SCHEMBL4540893 | 1.00 | — | — | |
| Fluoride SCHEMBL9278384 | 1.00 | — | — | |
| Fluoride SCHEMBL3179968 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5275 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122081898-A | Heavy hydrogen containing membranes | — | 2026-05-26 | — | — | CN | claimed |
| EP-4738472-A1 | CARBON ADDITIVE WITH A MODIFICATION FOR OR IN A USE FOR A BATTERY'S ELECTRODE AND THE BATTERY | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2026-05-06 | — | — | EP | claimed |
| US-20260123367-A1 | HARD MASK TRIMMING IN METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-30 | — | — | US | claimed |
| US-12615980-B2 | Etching of indium gallium zinc oxide | LAM RESEARCH CORPORATION (US) | 2026-04-28 | — | — | US | claimed |
| US-20260107547-A1 | HIGH SENSITIVITY ETCHING WITH GERMANIUM-CONTAINING GASES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | claimed |
| US-20260026282-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING LOW-TEMPERATURE PLASMA ETCHING PROCESS | SAMSUNG ELECTRONICS CO, LTD. (KR) | 2026-01-22 | — | — | US | claimed |
| US-12531211-B2 | Sulfur-containing molecules for high aspect ratio plasma etching processes | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2026-01-20 | — | — | US | claimed |
| US-12522680-B2 | Perovskite optoelectronic devices and method for manufacturing the same | SN DISPLAY CO., LTD. (KR) | 2026-01-13 | — | — | US | claimed |
| US-12520558-B2 | High selectivity etching with germanium-containing gases | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. | 2026-01-06 | — | — | US | claimed |
| EP-3963170-B1 | WEB PROTECTORS FOR USE IN A DOWNHOLE TOOL | ROBERTSON IP LLC (US) | 2025-12-24 | — | — | EP | claimed |
| US-4975259-A | MIXING WITH A CARRIER GAS, COOLING AND RECOVERY OF LIQUIFIED PRODUCCT; ELIMINATES OXYGEN, NITROGEN, ETC. | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-12-04 | — | — | US | claimed |
| EP-0345354-A1 | Process for purifying nitrogen-fluoride | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-12-13 | — | — | EP | claimed |
| CN-1036856-A | Stable superconductor and preparation technology thereof | RHONE POULENC CHIMIE (FR) | 1989-11-01 | — | — | CN | claimed |
| US-4857139-A | Method and apparatus for forming a layer | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1989-08-15 | — | — | US | claimed |
| US-4759179-A | Method for generating electronically excited NF for use in a laser | ROCKWELL INTERNATIONAL CORPORATION (US) | 1988-07-26 | — | — | US | claimed |
| CN-85104201-B | Method for producing 5-fluoro-2' -deoxyuridine from uridylic acid | 中国科学院上海有机化学研究所 | 1988-04-13 | — | — | CN | claimed |
| US-4568410-A | Selective plasma etching of silicon nitride in the presence of silicon oxide | MOTOROLA, INC. (US) | 1986-02-04 | — | — | US | claimed |
| US-4188592-A | Closed cycle chemical laser | UNITED TECHNOLOGIES CORPORATION (US) | 1980-02-12 | — | — | US | claimed |
| US-4165773-A | FROM FLUORINE ATOMS AND AZIDE RADICALS | ROCKWELL INTERNATIONAL CORPORATION (US) | 1979-08-28 | — | — | US | claimed |
| US-4031484-A | Portable chemical laser with gas recirculation | UNITED TECHNOLOGIES CORPORATION (US) | 1977-06-21 | — | — | US | claimed |