Fluoride

Fluoride

SCHEMBL41858

F.F.F.[N]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL4544067 1.00
Fluoride SCHEMBL4706001 1.00
Fluoride SCHEMBL5947020 1.00
Fluoride SCHEMBL1306081 1.00
Fluoride SCHEMBL36080 1.00
Fluoride SCHEMBL3226162 1.00
Fluoride SCHEMBL4704684 1.00
Fluoride SCHEMBL4540893 1.00
Fluoride SCHEMBL9278384 1.00
Fluoride SCHEMBL3179968 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 25193 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260145118-A1 PROCESS FOR TREATING FLUORINATED GASES NUMAT TECHNOLOGIES, INC. (US) 2026-05-28 US claimed
US-20260150635-A1 INHIBITED ATOMIC LAYER DEPOSITION FOR PATTERNING APPLICATIONS LAM RESEARCH CORPORATION (US) 2026-05-28 US claimed
US-12642024-B2 Plasma processing method HITACHI HIGH-TECH CORPORATION (JP) 2026-05-26 US claimed
CN-121586286-B Preparation method of semiconductor structure NEXCHIP SEMICONDUCTOR CORPORATION (CN) 2026-05-26 CN claimed
CN-122073931-A Display panel, preparation method thereof and display device 合肥维信诺科技有限公司 2026-05-22 CN claimed
WO-2026106608-A1 METAL-CONTAINING MATERIAL ETCH METHODS APPLIED MATERIALS, INC. (US) 2026-05-21 WO claimed
CN-122069948-A Epitaxial layer forming method 华虹半导体制造(无锡)有限公司 2026-05-19 CN claimed
WO-2026101809-A1 MOLYBDENUM LINER DEPOSITION LAM RESEARCH CORPORATION (US) 2026-05-15 WO claimed
WO-2026101630-A1 METHODS OF SELECTIVELY ETCHING SILICON APPLIED MATERIALS, INC. (US) 2026-05-15 WO claimed
CN-224242911-U Energy-saving and efficient evaporation system for nitrogen trifluoride production sewage 兰州裕隆气体股份有限公司 2026-05-15 CN claimed
US-4193976-A DEFLUORINATION USING METAL PARTICLES AIR PRODUCTS & CHEMICALS, INC. (US) 1980-03-18 US claimed
EP-0007175-A1 Purification of nitrogen trifluoride atmospheres AIR PRODUCTS AND CHEMICALS, INC. (US) 1980-01-23 EP claimed
EP-0004767-A1 Removal of dinitrogen difluoride from atmospheres containing nitrogen trifluoride AIR PRODUCTS AND CHEMICALS, INC. (US) 1979-10-17 EP claimed
US-4156598-A ADSORPTION OF NITROUS OXIDE ON A ZEOLITE AFTER PARTIAL REMOVAL OF DINITROGEN DIFULORIDE AIR PRODUCTS AND CHEMICALS, INC. (US) 1979-05-29 US claimed
US-4102988-A HYDROGEN OR DEUTERIUM FLUORIDE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 1978-07-25 US claimed
US-4091081-A FROM FLUORINE AND LIQUID AMMONIUM ACID FLUORIDE AIR PRODUCTS AND CHEMICALS, INC. (US) 1978-05-23 US claimed
US-4070439-A Process for the recovery of antimony pentachloride from a spent antimony catalyst mixture DAIKIN KOGYO CO., LTD. (JA) 1978-01-24 US claimed
US-4039971-A FAST DISCHARGE, HIGH POWER, ELECTRIC DISCHARGE PUMPED GAS LASER THE AEROSPACE CORPORATION (US) 1977-08-02 US claimed
US-4001380-A MANUFACTURE OF NITROGEN TRIFLUORIDE ALLIED CHEMICAL CORPORATION (US) 1977-01-04 US claimed
US-3961024-A Fluoro compound production ALLIED CHEMICAL CORPORATION (US) 1976-06-01 US claimed