SCHEMBL36136

SCHEMBL36136

CCCCCCCCCC(CO)CO

nearest known ligand 0.90

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.90
ALDH1A1 P00352 2/20 0.64
CYP2D6 P10635 2/20 0.52
SPHK1 Q9NYA1 2/20 0.52
GMNN O75496 1/20 0.52
POLB P06746 1/20 0.52
THPO P40225 1/20 0.52
MTOR P42345 1/20 0.52
BLM P54132 1/20 0.52
KDM4E B2RXH2 1/20 0.52
TP53 P04637 1/20 0.52
CYP1A2 P05177 1/20 0.52
CYP3A4 P08684 1/20 0.52
MAPT P10636 1/20 0.52
CETP P11597 1/20 0.52
HTT P42858 1/20 0.52
UBE2N P61088 1/20 0.52
TSHR P16473 2/20 0.48
HSD17B10 Q99714 1/20 0.48
MEN1 O00255 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL79863 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL4598071 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL5057787 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL9135822 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL9327522 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL5489399 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL182954 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL4621689 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL9701051 1.00 LMNA (0.90) LMNAALDH1A1CYP2D6SPHK1GMNN
SCHEMBL22426 0.97 LMNA (0.84) LMNAALDH1A1CYP2D6SPHK1GMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 395 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117863696-B MLCC release film base film and preparation method thereof 蔚芮德新材料科技江苏有限公司 2024-07-05 CN claimed
CN-118206753-A Photosensitive polyimide polymer, photosensitive polyimide resin composition, application of photosensitive polyimide resin composition and preparation method of pattern cured film 徐州博康信息化学品有限公司 2024-06-18 CN claimed
CN-118185289-A Corrosion-resistant sound-transmitting waterproof membrane for wearable equipment and preparation method thereof 宁波芯六麦新材料科技有限公司 2024-06-14 CN claimed
CN-117863696-A MLCC release film base film and preparation method thereof 蔚芮德新材料科技江苏有限公司 2024-04-12 CN claimed
CN-117715951-A Two-component polyurethane adhesive composition for film lamination in hot fill applications 汉高股份有限及两合公司 2024-03-15 CN claimed
CN-117651727-A Two-component polyurethane adhesive composition for film lamination 汉高股份有限及两合公司 2024-03-05 CN claimed
CN-117616063-A Polyurethane adhesive composition for film lamination 汉高股份有限及两合公司 2024-02-27 CN claimed
CN-113490721-B Modified copolyester resin and aqueous dispersion thereof 东洋纺MC株式会社 2024-01-16 CN claimed
EP-3368593-B1 IMPROVED BINDER COMPOSITIONS AND USES THEREOF KNAUF INSULATION SPRL (BE) 2023-12-06 EP claimed
US-11753568-B2 Adhesive composition and liquid-crystal display and method of disassembling the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2023-09-12 US claimed
EP-1484351-B1 Polycarbonate resin composition and polarizing sheet using the same MITSUBISHI GAS CHEMICAL CO (JP) 2009-04-22 EP claimed
EP-1904210-A2 FILTER MEDIUM FOR TECHNICAL APPLICATIONS, AND METHOD FOR THE PRODUCTION THEREOF Mahle International GmbH (DE) 2008-04-02 EP claimed
WO-2007006292-A2 FILTER MEDIUM FOR TECHNICAL APPLICATIONS, AND METHOD FOR THE PRODUCTION THEREOF MAHLE INTERNATIONAL GMBH (DE) 2007-01-18 WO claimed
US-20040245511-A1 Polycarbonate resin composition and polarizing sheet used the same MITSUBISHI GAS CHEMICAL COMPANY INC. 2004-12-09 US claimed
EP-1484351-A1 Polycarbonate resin composition and polarizing sheet using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-12-08 EP claimed
US-6359103-B1 POLYCONDENSING AROMATIC DIHYDROXY COMPOUN, TRICYCLO(5.2.1.0. SUP. 2.6)DECANEDIMETHANOL COMPOUND AND CARBONIC ACID DIESTER TO FORM COPOLYCARBONATE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-03-19 US claimed
US-6271336-B2 Process for producing aromatic-aliphatic copolycarbonate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-08-07 US claimed
EP-1106641-A2 Process for producing aromatic-aliphatic copolycarbonate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-06-13 EP claimed
US-20010002418-A1 Process for producing aromatic-aliphatic copolycarbonate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-31 US claimed
EP-0240260-A2 Optical resin materials MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1987-10-07 EP claimed