Methoxymethane

Methoxymethane

SCHEMBL36163

COC.COC(O)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.62

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.62
SRC P12931 1/20 0.53
KCNN4 O15554 1/20 0.44
TSHR P16473 3/20 0.44
CES2 O00748 3/20 0.39
TDP1 Q9NUW8 2/20 0.38
ALDH1A1 P00352 2/20 0.38
HSD17B10 Q99714 2/20 0.38
MAPT P10636 3/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
F2 P00734 1/20 0.38
LMNA P02545 1/20 0.38
KMT2A Q03164 1/20 0.37
MAPK1 P28482 2/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
DAO P14920 1/20 0.37
NAPRT Q6XQN6 1/20 0.37
KDM4E B2RXH2 1/20 0.37
ALOX15 P16050 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL277653 0.98 CES1 (0.65) CES1SRCKCNN4TSHRCES2
Ether SCHEMBL11039163 0.89 CES1 (0.54) CES1SRCKCNN4TSHRCES2
SCHEMBL11101775 0.82 CES1 (0.53) CES1SRCKCNN4TSHRCES2
SCHEMBL621110 0.81 CES1 (0.52) CES1SRCKCNN4TSHRCES2
Methoxymethane SCHEMBL9792184 0.81 CES1 (0.61) CES1SRCKCNN4TSHRCES2
Methoxymethane SCHEMBL11536323 0.81 CES1 (0.61) CES1SRCKCNN4TSHRCES2
SCHEMBL11072129 0.81 CES1 (0.53) CES1SRCKCNN4TSHRCES2
SCHEMBL3700347 0.80 KCNN4 (0.50) CES1SRCKCNN4TSHRALDH1A1
SCHEMBL8036600 0.80 KCNN4 (0.50) CES1SRCKCNN4TSHRALDH1A1
SCHEMBL2814807 0.80 CES1 (0.51) CES1SRCKCNN4TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6284431-B1 APPLICABLE TO PLATE-MAKING PROCESS IN WHICH DIGITIZED IMAGE IS DRAWN WITH AN INFRARED LASER DIRECTLY WITHOUT USING PHOTOTOOL SUCH AS A NEGATIVE FILM ASAHI KASEI KABUSHIKI KAISHA (JP) 2001-09-04 US claimed
US-5242782-A Flexographic printing plate ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1993-09-07 US claimed
US-4980269-A FLEXOGRAPHY PRINTING PLATES NIPPON ZEON CO., LTD. (JP) 1990-12-25 US claimed
US-20240182700-A1 RESIN COMPOSITION CONTAINING ACRYLIC BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2024-06-06 US disclosed
CN-117813552-A Photosensitive composition for pattern formation and flexographic plate 日本瑞翁株式会社 2024-04-02 CN disclosed
EP-4321545-A1 RESIN COMPOSITION CONTAINING ACRYLIC BLOCK COPOLYMER Kuraray Co., Ltd. (JP) 2024-02-14 EP disclosed
CN-115190892-B High molecular weight acrylic triblock copolymer and adhesive composition containing the same 株式会社可乐丽 2024-01-30 CN disclosed
EP-3778251-B1 BLOCK COPOLYMER COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATE ZEON CORP (JP) 2023-12-27 EP disclosed
CN-117120539-A Resin composition comprising acrylic block copolymer 株式会社可乐丽 2023-11-24 CN disclosed
CN-112689561-B Method for producing laminated body 株式会社可乐丽 2023-08-29 CN disclosed
CN-110383171-B Photosensitive resin composition for flexographic printing plate, flexographic printing original plate, flexographic printing plate, and copolymer 旭化成株式会社 2023-07-28 CN disclosed
EP-0439123-A2 A method for producing a photocured image structure Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1991-07-31 EP disclosed
US-4980269-A FLEXOGRAPHY PRINTING PLATES NIPPON ZEON CO., LTD. (JP) 1990-12-25 US disclosed
EP-0183552-B1 A PHOTOPOLYMERIZABLE COMPOSITION Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1988-03-16 EP disclosed
US-4632891-A Process for the production of images CIBA-GEIGY CORPORATION (US) 1986-12-30 US disclosed
EP-0183552-A2 A photopolymerizable composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1986-06-04 EP disclosed
US-4440802-A Preparation of prepregs from cellulosic fibers using water-borne resin compositions CIBA-GEIGY CORPORATION (US) 1984-04-03 US disclosed
US-4392930-A Photopolymerizable resins CIBA-GEIGY CORPORATION (US) 1983-07-12 US disclosed
US-4197130-A Photosensitive elastomeric composition and element ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-04-08 US disclosed
US-4108803-A Photopolymerizable epoxy resins containing pendant unsaturated ester or amidomethyl groups CIBA-GEIGY CORPORATION (US) 1978-08-22 US disclosed