⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL362057 | 1.00 | — | — | |
| SCHEMBL6929147 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL22771695 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL22771694 | 0.97 | — | — | |
| SCHEMBL21698143 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL22182443 | 0.82 | — | — | |
| SCHEMBL12131571 | 0.78 | — | — | |
| SCHEMBL12659050 | 0.78 | — | — | |
| SCHEMBL20747293 | 0.78 | ALDH1A1 (0.38) | — | |
| SCHEMBL27314512 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1467981-A1 | 4(HETERO-) ARYL SUBSTITUTED (THIA-/OXA-/PYRA) ZOLES FOR INHIBITION OF TIE-2 | Kylix Pharmaceuticals B.V. (NL) | 2004-10-20 | — | — | EP | claimed |
| WO-2003062215-A1 | 4(HETERO-) ARYL SUBSTITUTED (THIA-/OXA-/PYRA) ZOLES FOR INHIBITION OF TIE-2 | KYLIX PHARMACEUTICALS B.V. (NL) | 2003-07-31 | — | — | WO | claimed |
| US-20200123593-A1 | SYSTEMS AND METHODS FOR SAMPLE PREPARATION | Quantum-Si Incorporated (US) | 2020-04-23 | — | — | US | disclosed |
| US-10400266-B2 | Systems and methods for enhanced SCODA | THE UNIVERSITY OF BRITISH COLUMBIA (CA) | 2019-09-03 | — | — | US | disclosed |
| EP-3053926-B1 | FUSED PYRIMIDINE COMPOUND, INTERMEDIATE, PREPARATION METHOD THEREFOR, AND COMPOSITION AND APPLICATION THEREOF | SHANGHAI YINGLI PHARM CO LTD (CN) | 2018-08-08 | — | — | EP | disclosed |
| WO-2016195458-A2 | DOUBLE SPIRO ORGANIC COMPOUND AND ORGANIC ELECTRONIC ELEMENT COMPRISING SAME | 주식회사 엘지화학 | 2016-12-08 | — | — | WO | disclosed |
| EP-2593461-B1 | COMPOUNDS FOR THE REDUCTION OF BETA-AMYLOID PRODUCTION | BRISTOL MYERS SQUIBB CO (US) | 2016-08-17 | — | — | EP | disclosed |
| EP-3053985-A1 | HETEROCYCLIC COMPOUND AND ORGANIC LIGHT-EMITTING ELEMENT USING SAME | LG Chem, Ltd. (KR) | 2016-08-10 | — | — | EP | disclosed |
| WO-2014092481-A1 | ORGANIC COMPOUND, AND ORGANIC ELECTROLUMINESCENCE DEVICE COMPRISING SAME | 주식회사 두산 (KR) | 2014-06-19 | — | — | WO | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2301750-A1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | Fujifilm Corporation (JP) | 2011-03-30 | — | — | EP | disclosed |
| WO-2010090345-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | WO | disclosed |
| EP-1467981-A1 | 4(HETERO-) ARYL SUBSTITUTED (THIA-/OXA-/PYRA) ZOLES FOR INHIBITION OF TIE-2 | Kylix Pharmaceuticals B.V. (NL) | 2004-10-20 | — | — | EP | disclosed |
| WO-2003062215-A1 | 4(HETERO-) ARYL SUBSTITUTED (THIA-/OXA-/PYRA) ZOLES FOR INHIBITION OF TIE-2 | KYLIX PHARMACEUTICALS B.V. (NL) | 2003-07-31 | — | — | WO | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
| US-4558101-A | FROM HYDROCARBON POLYMER CONTAINING OLEFINIC GROUPS WITH HYDROGEN CARBON MONOXIDE AND AMINE USING GROUP 8 METAL CATALYST | W. R. GRACE & CO. (US) | 1985-12-10 | — | — | US | disclosed |
| US-4526936-A | Reacting polymeric hydrocarbon, primary or secondary amine, carbon monoxide, hydrogen, in the presence of group VIII metal catalyst | W. R. GRACE & CO. (US) | 1985-07-02 | — | — | US | disclosed |
| US-4312965-A | Process for forming amine/amide containing polymers | W. R. GRACE & CO. (US) | 1982-01-26 | — | — | US | disclosed |