Methacrylic Acid

Methacrylic Acid

SCHEMBL3621685

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.CC

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.50
FFAR3 O14843 1/20 0.46
LCK P06239 1/20 0.46
FYN P06241 1/20 0.46
ALDH1A1 P00352 3/20 0.42
LMNA P02545 3/20 0.39
HSD17B10 Q99714 1/20 0.37
TSHR P16473 2/20 0.36
THPO P40225 1/20 0.36
CA1 P00915 3/20 0.33
TGFBR1 P36897 1/20 0.33
ALOX15 P16050 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
KDM4E B2RXH2 1/20 0.32
TET2 Q6N021 1/20 0.32
LDHA P00338 1/20 0.31
LDHB P07195 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL698492 1.00
Methacrylic Acid SCHEMBL4087526 1.00 TDP1 (0.50) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL2802554 1.00 TDP1 (0.50) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL28138837 1.00 TDP1 (0.50) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL10940166 0.96 TDP1 (0.47) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL3099095 0.96 TDP1 (0.47) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL11235035 0.96 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL491341 0.96 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL15005463 0.96 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1
Methacrylic Acid SCHEMBL2230382 0.96 TDP1 (0.53) TDP1FFAR3LCKFYNALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6657691-B2 Front panel with an anti-reflection layer having particular compositions SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US claimed
CN-114007572-B Composite particles and method for producing same, personal care product, particles for personal care and method for producing same, personal care product, and personal care composition 凸版印刷株式会社 2024-11-15 CN disclosed
CN-114040939-B Composite particle and method for producing composite particle 凸版印刷株式会社 2023-10-31 CN disclosed
WO-2020243047-A1 CONTROLLED HEAT DELIVERY COMPOSITIONS BAMBU VAULT LLC (US) 2020-12-03 WO disclosed
WO-2020071658-A1 COPPER SULFIDE NANOPARTICLES HAVING CORE-SHELL STRUCTURE INCLUDED IN COATING COMPOSITION FOR BLOCKING NEAR-INFRARED LIGHT, AND PREPARATION METHOD THEREFOR 주식회사 앰트 2020-04-09 WO disclosed
CN-110431156-A Solidification compound TOKUYAMA DENTAL CORP 2019-11-08 CN disclosed
CN-110418628-A Curable composition for dental applications and its manufacturing method TOKUYAMA DENTAL CORP 2019-11-05 CN disclosed
CN-110392563-A Photocurable composition and dental prosthetic material 株式会社德山齿科 2019-10-29 CN disclosed
CN-109890343-A curable composition 株式会社德山齿科 2019-06-14 CN disclosed
CN-108289795-B Curable composition and dental filling/repairing material 株式会社德山齿科 2019-05-17 CN disclosed
CN-1337419-A Transparent rubber modified polystyrene resin composite QIMEI IND CO LTD (CN) 2002-02-27 CN disclosed
US-20020021393-A1 Display front panel having an anti-reflection layer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-21 US disclosed
EP-1168004-A2 Display front panel having an anti-reflection layer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed
CN-1315466-A Polystyrene resin for ejection moulding QIMEI IND CO LTD (CN) 2001-10-03 CN disclosed
US-4782100-A DENTURE LININGS TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1988-11-01 US disclosed
US-4533621-A FOR DIFFUSION TRANSFER KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-08-06 US disclosed
US-4513080-A BASED ON A CARBOXYLIC AMIDE AGFA-GEVAERT AG (DE) 1985-04-23 US disclosed
US-4459130-A WATER SOLUBLE ACID DYE AND WATER INSOLUBLE CATIONIC POLYMER AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1984-07-10 US disclosed
US-4353972-A ACRYLIC ESTER POLYMER CONTAINING QUATERNARY AMMONIUM OR PHOSPHONIUM GROUPS AGFA-GEVAERT AG (DE) 1982-10-12 US disclosed
US-4116715-A Method for removing photopolymers from metal substrates SMIGGEN FRANK J 1978-09-26 US disclosed