Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 9/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.44 |
| ▸ | RECQL | P46063 | 7/20 | 0.44 |
| ▸ | MAPT | P10636 | 7/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.44 |
| ▸ | APEX1 | P27695 | 4/20 | 0.44 |
| ▸ | BLM | P54132 | 4/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | MTOR | P42345 | 2/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
| ▸ | THPO | P40225 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.44 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29373036 | 1.00 | TDP1 (0.44) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL17445330 | 0.90 | TP53 (0.46) | TDP1KDM4EMAPTKMT2ALMNA | |
| SCHEMBL5046706 | 0.89 | ESR1 (0.42) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL29637883 | 0.88 | TDP1 (0.48) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL36674 | 0.88 | TDP1 (0.48) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL30374855 | 0.88 | TDP1 (0.48) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL18941007 | 0.87 | PTGS1 (0.39) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL1595123 | 0.85 | CA1 (0.48) | KDM4EMAPTKMT2ALMNATRPA1 | |
| SCHEMBL8943128 | 0.85 | TDP1 (0.37) | TDP1KDM4ERECQLMAPTKMT2A | |
| SCHEMBL24145980 | 0.83 | TDP1 (0.47) | TDP1KDM4ERECQLMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1649 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119875110-A | Polyphenylene ether, polyphenylene ether solution, resin film, prepreg, and metal-clad laminate | 旭化成株式会社 | 2025-04-25 | — | — | CN | claimed |
| US-7879528-B2 | For forming pattern that prevents contamination within the exposure apparatus; lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-01 | — | — | US | claimed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| US-20080176170-A1 | RESIST COMPOSITION FOR ELECTRON BEAM OR EUV | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-24 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| EP-1614005-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-01-11 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088424-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| EP-0827024-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2003-01-02 | — | — | EP | claimed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| US-6423458-B1 | — | — | None | — | — | US | disclosed |
| JP-6199719-A | — | — | None | — | — | JP | disclosed |
| EP-0445680-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| EP-0443533-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |